Sample number: "IBD-223(T)-NbN at RT-30/1.2 sccm-3.1 mTorr-325 mA-667 sec.-20210407
Background of the M.C. (Main chamber): 3.6*1e-8 torr
Substrate: MgO, Si3N4, Si, testchip, fuse quartz, IBD-220-NbNx (with PN2=18%)/Si
Mounting: vacuum oil
Temp. of Sub. (set /after growth/ holder): 17→18 C
Ar/N2: 30 sccm/1.2 sccm
APC: set value of the APC position is 220 (the pressure shows 2.9-3.4 mTorr)
DC current/ volt./ Watt.: 325 mA/ 354 V/ 115 W
Pre- deposit time: 300 sec.
Deposit time: 667 sec.; Thickness:~ 121.4 nm
Purpose: NbN at RT
The critical Temp of NbN film: no Tc (insulating)