Nb deposition
a. Wafer : test chip, Fused Quartz, Fused Quartz wafer
b. Wafer clean : no
c. Mounting : with diffusion pump oil
d. RF-clean : Yes, only N2
e. Working gas: Ar : 12 (SCCM), 10 mtorr
f. Thickness: 3176A /200s, rate: 15.8 A/s = 1.5 nm/s
g. Current: 1.7A
h. Tc = 9.2 K