Run #333 NbN deposition
a. Wafer :SiO2/ testchip
b. Wafer clean : no
c. Mounting : with diffusion pump oil
d. RF-clean : Yes, only N2
e. Working gas: Ar : 12 / N2 : 3.3 (SCCM), 7.4 mtorr
f. Thickness:3196 A, rate: 15.98 A/s
g. Current: 1.75A