Sample number: "IBD-206(T)-NbN on 3C- and 4H-SiC-900C-30/3.3 sccm-2.9 mTorr-270 mA-40 sec.-20200220
Background of the M.C. (Main chamber): 2.5*1e-8 torr
Substrate: 20"-BOE etched- 3CSiC ( 5 chips with 10x10 mm^2) and 4HSiC ( 4 chips with 10x9 mm^2)
Mounting: Silver glue
Temp. of Sub. (set /after growth/ holder): 900/ 750/ 535 degree C
Ar/N2: 30 sccm/3.3 sccm
APC: set value of the APC position is 235 (the pressure shows 2.6-3.4 mTorr)
DC current/ volt./ Watt.: 270 mA/ 446 V/ 120 W
Pre- deposit time: 300 sec.
Deposit time: 40 sec.; Thickness:~2 nm
Purpose: d, Tc, R, Jc of (001)-/ twined (111)-NbN
The critical Temp of NbN film/ undoped 3C-SiC sub.:
The critical Temp of NbN film/ undoped 4H-SiC sub.: