Run #345 NbN deposition
a. Wafer :SiO2/ testchip
b. Wafer clean : No
c. Mounting : with diffusion pump oil
d. RF-clean : Yes, only N2
e. Working gas: Ar : 12 / N2 : 3 (SCCM), 7.4 mtorr
f. Thickness: ( It's hard to measure the thickness, because the Au on the testchoip cannot be totally removed.)
g. Current: 1.7 A
h. Tc= 10.25 K