Run #335 NbN deposition
a. Wafer :HRSi
b. Wafer clean : no
c. Mounting : with diffusion pump oil
d. RF-clean : Yes, only N2
e. Working gas: Ar : 12 / N2 : 3.3 (SCCM), 7.4 mtorr
f. Thickness:159.8 A, rate: 15.98 A/s
g. Current: 1.75A
h. Tc=10.05 K