Wafer : Si wafer
with diffusion pump oil
base pressure: 9.9*E-8 torr
Ar/N2: 12/4.0 8.5 mtorr
pre-sputtering time: 300s
curve measuring time: 1003s
current: 0.5~2.8 A, step: 0.1 A, waiting time: 30s/step