NbN deposition parameters in common amount 5 sapmles
a. Wafer : test chip (SiO2 (600nm)/Si), HR Si, SiO2 (600nm)/Si
b. Wafer clean : no
c. Mounting : with diffusion pump oil
d. RF-clean : Yes, only Ar
e. Working gas:
# 281~286: Ar : 12 / N2 : 3.3 (SCCM)
# 287~288: Ar : 12 / N2 : 3.5 (SCCM)