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黃元德 (Yuan-Te Huang)
黃元德 (Yuan-Te Huang)
Integrated Nano-Aperture , Solid Immersion Lens , and Support Structure for Near-field Optical Systems
Integrated Nano-Aperture , Solid Immersion Lens , and Support Structure for Near-field Optical Systems
整合奈米孔、固態浸没透鏡及支撐結構於近場光學系統之應用
整合奈米孔、固態浸没透鏡及支撐結構於近場光學系統之應用
For near-field optical systems, Aperture and Solid Immersion Lens（SIL） that are popular techniques can overcome light diffraction limit and reduce spot size. According to previous researches, nano-aperture combined with SIL can improve the throughput owing to greater power densities at the aperture and reduce spot size to nano grade. However, the misalignment between the SIL and nano-aperture always occurred in assembling or bonding step. Earlier academic advanced a self–alignment technique to overcome the misalignment. But the method lack practical application in optical systems. In this thesis, the supporting structure can solve the problem.
For near-field optical systems, Aperture and Solid Immersion Lens（SIL） that are popular techniques can overcome light diffraction limit and reduce spot size. According to previous researches, nano-aperture combined with SIL can improve the throughput owing to greater power densities at the aperture and reduce spot size to nano grade. However, the misalignment between the SIL and nano-aperture always occurred in assembling or bonding step. Earlier academic advanced a self–alignment technique to overcome the misalignment. But the method lack practical application in optical systems. In this thesis, the supporting structure can solve the problem.
In fabrication results, the supporting structure can be made accurately. About nano-aperture ,100nm、200nm and 300 nm aperture are fabricated and the maximum error is less than 5% in comparison with the designed values. The SIL also can be made successfully. From the measurement results of far-field system, manifest that SIL can reduce spot and the 15μm-diameter SIL/300nm-diameter circular aperture component has 1.216 times enhancement of transmission compared with 329nm-diameter aperture alone.
In fabrication results, the supporting structure can be made accurately. About nano-aperture ,100nm、200nm and 300 nm aperture are fabricated and the maximum error is less than 5% in comparison with the designed values. The SIL also can be made successfully. From the measurement results of far-field system, manifest that SIL can reduce spot and the 15μm-diameter SIL/300nm-diameter circular aperture component has 1.216 times enhancement of transmission compared with 329nm-diameter aperture alone.
Basing on the measurement results, the supporting structure make the SIL and nano-Aperture more feasible.
Basing on the measurement results, the supporting structure make the SIL and nano-Aperture more feasible.
[1] Y.-T. Huang and W. Hsu, “A Simulation Model on Photoresist SU-8 Thickness after Development under Partial Exposure with Reflection Effect.” Japanese Journal of Applied Physics 2014, 53, 036505.
[1] Y.-T. Huang and W. Hsu, “A Simulation Model on Photoresist SU-8 Thickness after Development under Partial Exposure with Reflection Effect.” Japanese Journal of Applied Physics 2014, 53, 036505.
[2] Y.-T. Huang, H.-L. Chen, W. Hsu, “An Analytical Model for Calculating the Pull-in Voltage of Micro Cantilever Beams Subjected to Tilted and Curled Effects”, Microelectronic Engineering 2014. (in press)
[2] Y.-T. Huang, H.-L. Chen, W. Hsu, “An Analytical Model for Calculating the Pull-in Voltage of Micro Cantilever Beams Subjected to Tilted and Curled Effects”, Microelectronic Engineering 2014. (in press)
[3] Y.-T. Huang and W. Hsu, “Fabricating embedded SU-8microstructures with asymmetric inside cross section by double-side multiplepartial exposure method”, Microelectronic Engineering 2014, 121, 64-67.
[3] Y.-T. Huang and W. Hsu, “Fabricating embedded SU-8microstructures with asymmetric inside cross section by double-side multiplepartial exposure method”, Microelectronic Engineering 2014, 121, 64-67.
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