For near-field recording systems, Aperture and Solid Immersion Lens(SIL) are two popular techniques to overcome light diffraction limit and reduce spot size. In aperture systems, seeing that light spot size is directly determined by aperture size, aperture systems can provide an ultra-high resolution by reducing the aperture size to nano-scale. However, nano-aperture suffers from low power throughput which results in the recording speed unable to be promoted. SIL systems, while can providing a smaller spot size than obtained in conventional optical recording systems with still maintaining high optical throughput, do not have the resolution observed from aperture probe systems. According to previous researches, nano-aperture combined with SIL/SSIL can improve the throughput owing to greater power densities at the aperture. However, the misalignment between the SIL/SSIL and nano-aperture always occurred in assembling or bonding step. How to align the nano-aperture and SIL/SSIL together precisely has not proposed yet. In this research, the purpose is concentrated on combination of SIL/SSIL and nano-aperture by Nano/Micro Electro-Mechanical Systems(N/MEMS) technology, where nano-aperture is fabricated with Focused Ion Beam(FIB)system and SIL /SSIL are formed by thermal reflowing process. In order to overcome the misalignment between SIL/SSIL and nano-aperture, a self-alignment technique based on self-modulation by surface tension during thermal reflowing process is proposed. About aperture designs, the influence of varied shapes of apertures at optical throughput is also studied. Here, circular apertures and C-shaped apertures are introduced.