The micromirror is fabricated by thick photoresist and electroplarting techniques. The fabrication processes are conducted on two wafers. The structures of the electrodes, support and mushroom-like joint are fabricated on an n-type silicon wafer, the micromirror plate is manufactured on the other. The micromirror will tilt an inclined angle after assembly together. There are 10 electrodes under the mirror plate, and the isolated layer between the mirror plate and electrodes is the thin film of silicon dioxide. The micromirror is driven by electrostatic force.