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孫翊庭 (Yi-Ting Sun)
孫翊庭 (Yi-Ting Sun)
Study on fabrication process of MO pick-up head combining SSIL,microcoils and aperture for near field recording
Study on fabrication process of MO pick-up head combining SSIL,microcoils and aperture for near field recording
結合SSIL、磁線圈與微孔於MO近場光學讀取頭的製程研究
結合SSIL、磁線圈與微孔於MO近場光學讀取頭的製程研究
The research focuses on the optical data storage system by near field recording that can break through the diffraction limit. The MO (Magneto-Optic) pickup head is studied and fabricated by MEMS(MicroElectroMechanical System)technology. The MO pickup head combines (1) air bearing, (2) microcoils, (3) nano-aperture, (4) Supersphere Solid Immersion Lens (SSIL). The proposed process is a batch process and does not need assembly to achieve a MO pick up head combining SSIL, nano aperture, air bearing and magnetic coils for high-density data storage. And a new process is also proposed to fabricate the SSIL.
The research focuses on the optical data storage system by near field recording that can break through the diffraction limit. The MO (Magneto-Optic) pickup head is studied and fabricated by MEMS(MicroElectroMechanical System)technology. The MO pickup head combines (1) air bearing, (2) microcoils, (3) nano-aperture, (4) Supersphere Solid Immersion Lens (SSIL). The proposed process is a batch process and does not need assembly to achieve a MO pick up head combining SSIL, nano aperture, air bearing and magnetic coils for high-density data storage. And a new process is also proposed to fabricate the SSIL.
The spot size is measured to verify the process is feasible. The nano-aperture about 340 nm is fabricated by the “electroplating method”. The Full Width Half Maximum (FWHM) spot size is about 750 nm to 800 nm after the focused incident light passing through the nano-aperture about 500 nm. This is due to the available measured equipment is far filed detection. The dimensions of the SSIL is observed and compared with the designed values, the maximum errors occur in dimensions is less than 2.4% and the refraction index of the SSIL is about 1.66 at this time. The microcoils and interconnection lines are fabricated by UV-LIGA technology. The SU-8 is chosen to strengthen the pickup head.
The spot size is measured to verify the process is feasible. The nano-aperture about 340 nm is fabricated by the “electroplating method”. The Full Width Half Maximum (FWHM) spot size is about 750 nm to 800 nm after the focused incident light passing through the nano-aperture about 500 nm. This is due to the available measured equipment is far filed detection. The dimensions of the SSIL is observed and compared with the designed values, the maximum errors occur in dimensions is less than 2.4% and the refraction index of the SSIL is about 1.66 at this time. The microcoils and interconnection lines are fabricated by UV-LIGA technology. The SU-8 is chosen to strengthen the pickup head.
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