Embedded Files
Alessandro, Jon, Ciaran + Chris, Jharna
Technician support: Jon Humphreys Callum Smith (previously David Gourlay)
18/8/21 Callum Smith
Cryopump absorber changed and He recharged
Cryopump reaches 14K but makes loud knocking noise - Scotech recommend replacement/exchange due to worn seals.
29/6/21
From: Jon Humphreys <Jon.Humphreys@glasgow.ac.uk>
Sent: 29 June 2021 17:48
To: Robert Hadfield <Robert.Hadfield@glasgow.ac.uk>; Martin Weides <Martin.Weides@glasgow.ac.uk>; Jharna Paul <Jharna.Paul@glasgow.ac.uk>; Valentino Seferai (PGR) <v.seferai.1@research.gla.ac.uk>
Subject: Re: Plassys VI
Hi All,
the Scotech Engineer who was in today had a look at the Plassys VI Cryo Pump, and he thinks it needs a service exchange. The pump was last serviced 3 and a half years ago so it is due to be replaced. He is putting a quote together for us. I will let you know when I receive it. Hopefully, the old pump will last another few weeks until he sources a replacement.
Best Regards
Jon
From: Linda Pollock <Linda.Pollock@glasgow.ac.uk>
Sent: 09 June 2021 17:09
Subject: Re: Plassys VI fault cryo pump
Dear Robert All
Walter was here to look at the hard drive problem .....below is his response ( We need to order a new USB)
Plassys V1 : complaining about backup,
Checked the status of the windows backup,
There are 2 partitions but looks like a single physical disk.
Configured to backup to F: (Kingston USB sick) not present
Requires a new USB stick to be purchased and installed,
Please obtain a 128GB USB
Outcome New USB ordered
8_6_21
From: Valentino Seferai (PGR) <v.seferai.1@research.gla.ac.uk>
Sent: 08 June 2021 13:22
To: Lesley Donaldson <Lesley.Donaldson@glasgow.ac.uk>
Cc: Jharna Paul <Jharna.Paul@glasgow.ac.uk>; Jonathan Collins <Jonathan.Collins@glasgow.ac.uk>; Ciaran Lennon (PGR) <2085798L@student.gla.ac.uk>; Linda Pollock <Linda.Pollock@glasgow.ac.uk>; Jon Humphreys <Jon.Humphreys@glasgow.ac.uk>; Martin Weides <Martin.Weides@glasgow.ac.uk>; Robert Hadfield <Robert.Hadfield@glasgow.ac.uk>
Subject: RE: Plassys VI fault cryo pump
Hi Lesley
Here is a time lapse video of how the Plassys VI is behaving.
https://1drv.ms/v/s!Aiboz2ZytfRy2iNfzyH2tzQbr05E?e=emFSM0
Sorry but too large a file to upload in a mail.
It does this continuously and we are worried about the cryo pump. I don’t think this is normal and also I don’t think we should use the tool as it is.
Thank you
Best Regards
Valentino
26/2/21
Colin Roberts Recharged He compressor for cryopump with high purity He
Callum regened cryo directly after
27/1/21
Cryo regen Colin Roberts
7/10/20
Ta target installed in place of MoSi (Chris/Ciaran)
30/9/20
RF2 short - fixed by opening chamber Ciaran/David Gourlay
30_9_19
INSTALLATION OF O2 OXIDATION IN LOADLOCK
Benoit Chaudun <benoit.chaudun@plassys.com>
David Looms <davidl@daleksw.com>
Martin Weides' team
To enable AlOx tunnel junction process
28_8_19
NEW HELIUM COMPRESSOR
CRYOPUMP TEMPERATURE 14 K (1.4 Volts) (NEVER RECORDED BEFORE)
BASE PRESSURE MAIN CHAMBER: 8E-9 Torr
SYSTEM WORKS FINE
22_03_19
Maintenance of Plassys VI:
a) Change of shields/shutters of Ge, Si and Ti targets with spare shields/shutters.
b) Old shields/shutters to be sent to the STS company for cleaning and repair (Ti shield looks very used)
Plassys VI situation:
a) Helium compressor OFF: last week was overheated and it turned off automatically. Jon Humphreys contacted Trillium company for assistance.
b) Turbopumps OFF: David Gourlay wanted to change the Bearing and Oil Cartridge of Load Loack Turbopump, but he needs other pieces. He contacted the company Edwards. Meanwhile, he closed the water cooling of turbos.
15/02/19
Cryopump error
Regeneration of cryopump
Cooling down: 17K (more than 4h)
The temperature rises to 24 K when the main gate is open
a) Compressor
The switch works
Pressure: 250psi (regular, no lower helium liquid)
The base pressure of main chamber is 5E-8 Torr and it's continuing to decrease
14/02/19
New switch of the cryopump helium compressor (Oxford Austin Sc. M-125)
Switch Fixed
Cryopump operating
Max Voltage (when the valve is closed): 1.14 Volts (17 K)
When the valve is opened: 24 K (1.11Volts)
Base Pressure: 8.5E-9 Torr (after Ti sputtering)
2pm: Regeneration of the Cryopump
22/10/18
Load Lock Rough Pump replaced
System works
Dessiccator pump Broken
4/10/18
Installation of a new window (Kurt J. Lesker Company manufacturer) for the Plassys VI
Installation of aluminium shields/shutter (cleaned by STS company) for Nb and MoSi targets
25/9/18
Load Lock Rough Pump (nDXS) strange noise
JWNC maintenance: bearing replacement kit required
19/9/2018
STS Visitors
Cleaning of shields inside the main chamber
Chimney/Shields of Nb and Mo target delivered to STS for cleaning (returning next week)
NOTE: A part of main chamber shields looks deformed
13/9/2018
Nb sputtering on 6 inch Si Wafer
Load Lock Etching (Cleaning Wafer)
Ar flow: 15sccm
Pressure: 5.2mTorr
RF:100W
Pre-Sputtering (Cleaning Cathode)
Ar flow:50sccm
Pressure:2.52mTorr
I:0.9A
Sputtering parameters
Ar flow: 30sccm
Pressure: 1.55mTorr
Current:0.9A
Distance: 100mm
Rotation: 50rpm
Throttle Valve: 75
Notes:
The DC supply was not turned off after the pre-sputtering process
The Ar flow was reduced to 30sccm by 1min ramp time
The shutter was opened 1min after the gas flow was 30sccm
11/9/2018
RHH UN AC
Chamber opened and inspected - no flakes
Nb chimney investigated
Vacuumed interior
Sample holders to be re-organised and labelled - UN
From: jp Fauvarque <jp.fauvarque@plassys.com>
Sent: 10 September 2018 16:28
To: Robert Hadfield <Robert.Hadfield@glasgow.ac.uk>; Alessandro Casaburi <Alessandro.Casaburi@glasgow.ac.uk>; Martin Weides <Martin.Weides@glasgow.ac.uk>; Umberto Nasti <u.nasti.1@research.gla.ac.uk>
Cc: 'Luc Pattard' <pattard.plassys@gmail.com>
Subject: Cleaning chimneys
Dear Robert
Following your question of this morning, here is the methodology we are using for ball basting the chimneys or any part close to some deposition sources:
Ball blasting the parts with using a pressure close to 6 bars with using corundum (granulometry 250/500 microns
Then clean in ultrasonic bath (use detergent TFD4 for stainless steel parts and neutral detergent TFD for aluminium/bronze/copper alloys)
Rinsing with water
Drying the part (a oven can be used up to 200°C depending on how sensitive are the alloys of the part)
Best regards
Jean-Philippe Fauvarque
Plassys-Bestek
91630 Marolles en Hurepoix
Tel: +33 (0)1.64.56.20.00
Mob : +33 (0)6.08.03.75.92
18/05/2018
New Trillium CryoPlex CP8 Cryopump
New Trillium CryoPlex CP8 Cryopump
SERIAL NUMBER: 350A1529
SERIAL NUMBER: 350A1529
Max Voltage (when the valve is closed): 1.3 Volts (15.5 K)
When the valve is opened: 16.5 K
14/3/2018
Maintenance of Plassys VI:
1) Cleaning of HV gate valve Series 110 DN63-200mm
The HV gate vale didn't show high impurities and flakes. It has been just cleaned by IPA.
Neither the part between the main chamber and the load loack showed large flicks. It has been cleaned by IPA and vacuum cleaner
2) Installation of a new Nb target with a new shield
A new Nb target (IMA manufacturer) has been installed in Palssys VI following this procedure:
a) Bonding the target to a Cu backing plate by silver paste. Put the target and backing plate on a hot plate at 60º C in the air for 20min
to dry the silver paste
b) Mount the target on the gun (Cath5). Then assembly the shield and the shutter using screws. The gap between the shutter and the border
of the shield is less than 0.5cm to avoid contamination with other targets
Systems Specifications
5 confocal sputter guns
loadlock with plasma cleaning
Sputter guns MAK 3" gun
Meivac
http://www.meivac.com/3-0-mak-planar-magnetron-sputter-source-l300a01/
MAK diagram
http://www.meivac.com/wp-content/uploads/2015/04/L300A01_EXT.pdf
MAK user manual
http://www.meivac.com/wp-content/uploads/2013/02/MAK%20MANUAL-09-11-08%20WebSite.pdf
- RECOMMENDED READING
HISTORY
Delivered to JWNC 15/4/2014
Assembly/commissioning/training 22-25/4/2014
Patrick Smutek David Looms Plassys
Specifications :
•340 Litre Ultra High Vacuum sputtering chamber
•5 confocal magnetron sputter guns (pointing upwards)
(sputter target : 3'' diameter , 0.25'' thickness)
•Power supply ( 3 DC supply and 2 RF supply)
•Co sputtering from two or more targets
System Installation and Acceptance Test :
•Sputter Deposition System Installed in April, 2014
•Five targets (Nb, Ti, Ge, Si & Mo)
•Deposited 100 nm Nb and measured in Cambridge with liquid He
(June, 2014)
•Tc measured : 9.2 K
•Later on verified in thin film testing station, uni glasgow (Ocotber,2014)
NbTiN Optimization:
•October, 2014 – January, 2015:
• Extensive Deposition & Optimization (at room temperature)
•Thick Films used first
•Tc measured for Optimized Recipe: 6.9 K for 6 nm Thick Film
•7 nm thick film deposited according to same recipe gave good devices on 1550 DBR (sourced by A Casaburi from Helia Photonics)
Developments Jan-April 2015:
•January, 2015:
•Substrate heating showed good improvement in Tc (10.3 K) NbTiN 6-7 nm thickness on Si substrate
•Heating Coil Burnt (February, 2015)
•Patrick Smutek from Plassys visited JWNC and fixed the heater (April, 2015)
•Niobium Target replaced
(Previous Target completely Eroded)
MoSi:
•Started in February, 2015
•Extensive Optimization from May, 2015
•Mostly deposited at room temperature, seldom using LN2 cooling
•5 nm thick MoSi film on Si substrate gives 5.4 K Tc
MoSi on SOI substrate:
•Showed promising superconducting property when devices fabricated on MoSi films deposited on silicon-on-insulator (SOI) substrate (autumn 2015)
•Device Patterned on 10 nm MoSi gave around 6K Tc (K Erotokritou)
•5 nm MoSi Film was also superconducting (Tc 5 K? KE to test)
•
• Tc degrades when film deposited on DBR
TiN optimisation
•Started November 2015
•Room temperature and heated TiN
•Reactive sputtering from Ti target.
•Best result TiN 4 K on heated Si substrate
Delivered to JWNC 15/4/2014
Assembly/commissioning/training 22-25/4/2014
Patrick Smutek David Looms Plassys
23/4/2014
AC RHH
Nb deposited across 6" wafer
15 mins deposition
step height measured across the centre via Dektak ~175 nm
Full list of targets in system and storage:
List of targets currently in system:
https://sites.google.com/site/quantumsensorsglasgow/inventories/sputter-targets/targets-list
Page updated
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