Department of Electrical Engineering and Information Systems, The University of Tokyo
2026年度
学術誌 (Journal)
C.-T. Chen, K. Toprasertpong, T. Irisawa, W. H. Chang, S. Migita, Y. Morita, H. Ota, and T. Maeda, “Excess oxygen modulation through channel thickness scaling and annealing ambient for AlOx-passivated ultrathin InOx FETs,” IEEE Journal of the Electron Devices Society (Accepted).
H. Matsukawa, M. Takenaka, S. Takagi, and K. Toprasertpong, “Dynamic dielectric-constant enhancement in Hf1-xZrxO2 high-k dielectrics revealed by fast C–V measurement,” Japanese Journal of Applied Physics 65, p. 100901, May 2026.
C. Chai, R. Tang, M. Okano, K. Toprasertpong, and M. Takenaka, “Time- and wavelength-multiplexed photonic matrix-matrix multiplication processor with on-chip wavelength (de)multiplexers,” Optics Express 34, p. 17539, May 2026.
C.-T. Chen, K. Toprasertpong, T. Irisawa, S. Nunomura, S. Migita, W. H. Chang, R. Nishino, Y. Morita, H. Ota, and T. Maeda, “Impact of excess oxygen on electrical characteristics and bias stability in PEALD ultrathin InOx FETs,” Japanese Journal of Applied Physics 65, p. 070802, Apr. 2026.
H. Sakumoto, T. Piyapatarakul, K. Toprasertpong, S. Takagi, and Mitsuru Takenaka, “Low-loss, low-power, MOSCAP optical phase shifter on InP membrane platform,” Optics Express 34, pp. 13142-13152, Apr. 2026.
E. Nako, R. Nakane, M. Takenaka, K. Toprasertpong, and S. Takagi, “Substrate-Voltage-Controlled Temporal Nonlinearity in Ferroelectric FET-based Reservoir Computing,” APL Machine Learning 4, p. 026102, Apr. 2026.
C.-T. Chen, K. Toprasertpong, T. Irisawa, S. Nunomura, S. Migita, W. H. Chang, R. Nishino, Y. Morita, H. Ota, and T. Maeda, “Impact of excess oxygen on electrical characteristics and bias stability in PEALD ultrathin InOx FETs,” Japanese Journal of Applied Physics 65, p. 070802, Apr. 2026.
H. Sakumoto, T. Piyapatarakul, K. Toprasertpong, S. Takagi, and Mitsuru Takenaka, “Low-loss, low-power, MOSCAP optical phase shifter on InP membrane platform,” Optics Express 34, pp. 13142-13152, Apr. 2026.
国際会議 (International Conference)
K. Toprasertpong, Z. Liu, K. Ito, H. Matsukawa, K. Tahara, M. Takenaka, and S. Takagi, “Low-voltage ferroelectric memory enabled by ultra-thin Hf1-xZrxO2: scaling benefits and reliability trade-offs,” 84th Device Research Conference (DRC 2026), Ann Arbor, MI, USA, Jun. 21-24, 2026 (Invited talk).
Y. Morita, T. Kawanago, T. Kamioka, Y. Mitani, T. Nabatame, T. Onaya, N. Fukata, W. Jevasuwan, K. Tsukagoshi, T. Hoshii, K. Toprasertpong, A. Tamura, K. Kita, N. Okada, K. Manabe, W. Mizubayashi, H. Ota, T. Matsukawa, and S. Migita, “Ultra-scaling of high-k gate stacks (CET 0.9 nm) by a novel low thermal-budget (500 °C) oxygen-passivated interfacial layer (O-PAS IL),” 2026 Symposia on VLSI Technology and Circuits, T7.1, Honolulu, HI, USA, Jun. 14-18, 2026.
T. Kamioka, T. Nabatame, H. Matsukawa, T. Kawanago, Y. Morita, K. Toprasertpong, Y. Mitani, T. Onaya, N. Fukata, W. Jevasuwan, K. Tsukagoshi, T. Hoshii, A. Tamura, K. Kita, N. Okada, K. Manabe, W. Mizubayashi, H. Ota, T. Matsukawa, and S. Migita, “Mitigating intrinsic fixed-charge-induced Vfb fluctuation using a “neutral TiO2 dipole” layer,” 2026 Symposia on VLSI Technology and Circuits, T7.3, Honolulu, HI, USA, Jun. 14-18, 2026.
S. Takagi, K. Sumita, Z. Jin, Y. Chen, H. Oka, T. Mori, M. Takenaka, and K. Toprasertpong, “U Understanding of carrier transport properties in Si cryo CMOS Understanding of carrier transport properties in Si cryo CMOS,” Silicon Nanoelectronics Workshop (SNW) 2026, No. 1.1, Honolulu, HI, USA, Jun. 13-14, 2026 (Plenary talk).
Z. Liu, S. Takagi, M. Takenaka, and K. Toprasertpong, “Unveiling underlying mechanism of fatigue in HfO2-Based ferroelectric films: imprint as the origin of fatigue,” Silicon Nanoelectronics Workshop (SNW) 2026, No. 6.3, Honolulu, HI, USA, Jun. 13-14, 2026.
T. Liu, Z. Liu, K. Ito, Z. Jin, S. Takagi, M. Takenaka, and K. Toprasertpong, “Frequency-dependent field cycling for imprint recovery in ultra-thin Hf0.5Zr0.5O2 ferroelectric capacitors,” Silicon Nanoelectronics Workshop (SNW) 2026, No. 9.1, Honolulu, HI, USA, Jun. 13-14, 2026.
K. Toprasertpong, Z. Liu, K. Ito, H. Matsukawa, K. Tahara, M. Takenaka, and S. Takagi, “Thickness scaling of ferroelectric Hf1-xZrxO2: Opportunities for low-voltage memory and its challenges,” Global Conference of Innovation Materials 2026 (GCIM2026) & MRS-K, Jeju, Korea, May. 31-Jun. 4, 2026 (Invited talk).
T. Akazawa, X. Gao, H. Tang, K. Toprasertpong, and M. Takenaka, “Non-volatile operation of III–V/Si hybrid MOS optical phase shifter using BEOL compatible oxide semiconductor transistor,” Compound Semiconductor Week 2026 (CSW2026), ThD2-04, Alberta, Canada, May 26-30, 2026.
H. Sakumoto, K. Toprasertpong, and M. Takenaka, “Temperature stability of InP membrane MOSCAP optical phase shifter,” Compound Semiconductor Week 2026 (CSW2026), ThD2-03, Alberta, Canada, May 26-30, 2026.
K. Komatsu, T. Akazawa, S. Monfray, F. Boeuf, K. Toprasertpong, and M. Takenaka, “High-responsivity InGaAs MSM Photodetector with narrow-gap parallel-electrode configuration integrated on Si waveguide,” Compound Semiconductor Week 2026 (CSW2026), TuD4-05, Alberta, Canada, May 26-30, 2026.
H. Mori, K. Komatsu, K. Toprasertpong, and M. Takenaka, “Formation and optical characterization of Ni-InGaAsP alloy for plasmonic electro-absorption modulators,” Compound Semiconductor Week 2026 (CSW2026), TuP3D-11, Alberta, Canada, May 26-30, 2026.
C.-T. Chen, K. Ishiyama, K. Toprasertpong, T. Irisawa, W. H. Chang, R. Nishino, S. Migita, Y. Morita, H. Ota, and T. Maeda, “Thermal Stability enhancement in AlOx-passivated ultrathin InOx FETs by using PEALD-AlOx dielectric”, 2026 International Symposium on VLSI Technology, Systems and Applications (VLSI-TSA 2026), T3-2, Hsinchu, Taiwan, Apr. 13-17, 2026.
国内学会 (Japanese Domestic Conference)