Standard Operation Procedure for Descum
Purpose: to remove residual resist and oxide from the surface of the sample.
Location: Pettit and Marcus Inorganic Cleanrooms
Tools required:
1. Pettit: Plasma Therm RIE
2. Marcus Inorganic: Vision RIE
Setup Procedures:
1. Make sure the backside of your sample is clean.
2. Program the standard descum recipe on the appropriate tool for 5 minutes or less. A typical descum is 30-60 seconds.
Number of substrates: up to four, 4” wafers
Process Procedures:
1. Place your sample in the process chamber.
2. Run the recipe.
3. Take not of the process parameters during the etch step (1 min or less).
4. Remove your sample from the chamber.
5. Run the standard cleaning recipe.
Time: approximately 15 minutes
Comments:
a. Descum is only allowed to be run for up to one minute.