[2026] Manager: Sooji Byun ๐น๐
[2026] Manager: Sooji Byun ๐น๐
-์กฐ๋ํ ๋ฐ์ฌ About the Data Analysis of Optical Emission Spectra of Reactive Ion Etching ProcessesโThe Method of Spectral Redundancy Reduction MDPI
-์ํ์ฃผ ํ๋ผ์ฆ๋ง ์๊ฐ ๊ธฐ์ ch.4
(26/07/30)
-์ต์ง์ ํ๋ผ์ฆ๋ง ์๊ฐ ๊ธฐ์ ch.3
(26/07/23)
-๊น์ฑํธ Scaling nanoribbon transistors with monolaye transition metal dichalcogenides Nature nanotechnology
-์ํ์ฃผ ํ๋ผ์ฆ๋ง ์๊ฐ ๊ธฐ์ ch.2
(26/07/16)
-์ต์ฑ์ผ Adaptive learning strategies for addressing chamber variations in real-time endpoint detection of semiconductor etching Journal of Intelligent Manufacturingย
-์ต์ง์ ํ๋ผ์ฆ๋ง ์๊ฐ ๊ธฐ์ ch.1
(26/07/10)
-๋ณ์์ง Integrated Plasma-Based Synthesis and etching for wafer-scale WS2 with atomic layer precision I-YES ๊ตฌ๋๋ฐํ ์ฐ์ต
(26/06/26)
-์กฐ๋ํ ๋ฐ์ฌ DIC-based Prediction of Etch Depth and Process Variability in Plasma Etching I-YES ๊ตฌ๋๋ฐํ ์ฐ์ต
(26/06/19)
-๊ณ ์์ RGB-Based Machine Learning for Multilayer-aware Thickness Prediction & End-Point Detection in Plasma Etching I-YES ๊ตฌ๋๋ฐํ ์ฐ์ต
-๋ณ์์ง Systematic Characterization of Plasma-Etched Trenches on
4H-SiC Wafers ย ACS Omegaย
(26/06/12)
-์กฐ๋ํ ๋ฐ์ฌ Al2O3 growth in PMMA thin films by sequential infiltration synthesis: in situ thickness evolution and mass uptake investigation ย Materials Advances
-์ต์ฑ์ผ Inductively couple d plasma etching of silicon carbide: a review Journal of Materials Science: Materials in Electronicsย
(26/05/22)
-๊น์ฑํธ Low-temperature wafer-scale growth of ultrathin tungsten disulfide for bifunctional interconnect barriers and liners ย Nature Electronics
-๊ณ ๋ฏผ๊ฒฝ ๋ฐ์ฌ Atomic InOx motif-mediated cross-linking in PMMA via sequential infiltration synthesis for negative-tone lithography ์ธ๋ฏธ๋
(26/05/15)
-๊ถ์ฉ์ค Etching process prediction based on cascade recurrent neural network ย Engineering Applications of Artificial Intelligence
-์ ์ฑ์ฐ Low-temperature growth of MoS2 on polymer and thin glass substrates for flexible electronics Nature nanotechnology
(26/05/08)
-์กฐ๋ํ ๋ฐ์ฌ Comprehensive Study of the Chemical, Physical, and Structural Evolution of Molecular Layer Deposited Alucone Films during Thermal Processing ย Chemistry of Materials
-๋ณ์์ง Thickness dependence of work function, ionization energy, and electron affinity of Mo and W dichalcogenides from DFT and GW calculations Physical Review B
(26/03/13)
-๊น์ฑํธ Reliable Off-chip learning enabled by uniform and low-voltage 2D TMDc Nanoristor ์ง๊ณตํํ ๊ตฌ๋๋ฐํ
-๊ฐ๋ฏผ์ง ํ๋ผ์ฆ๋ง ์๊ฐ์์ DIC-๋จธ์ ๋ฌ๋ ๊ธฐ๋ฐ ์๊ฐ๊น์ด ์์ธก๊ณผ ๋ถํ์ค์ฑ ์ ๋ํ: XAIํด์ ๋ฐ RBRDO ๊ธฐ๋ฐ ์ต์ ํ ์ง๊ณตํํ ๊ตฌ๋๋ฐํ
-์ ์ฑ์ฐ Grain-Dominant Switching Behavior in WS2 Memristor ์ธ๋ฏธ๋#1
(26/02/20)
-ํ์์ Room Temperature Semiconductor-Metal Transition of MoTe2 Thin Films Engineered by Strain Nano Letters
-์ฌํ์ฐ High-performance ferroelectric field-effect transistors with ultra-thin indium tin oxide channels for flexible and transparent electronics Nature Communications
(26/02/13)
-์กฐ๋ํ ํ๋ผ์ฆ๋ง ์๊ฐ ๊ธฐ์ (ch.10)
-๋ณ์์ง Sequential Infiltration Synthesis of Silicon Dioxide in Polymers with Ester Groups-insight from In Situ Infrared Spectroscopy Journal of Physical Chemistry C
-๊น์ฑํธ WS2/Graphene Heterostructures by Electrochemical Deposition for Photodetectors and ACS Memristors Applied Electronic Materials
(26/02/05)
-์กฐ๋ํ ๋ฐ์ฌ ํ๋ผ์ฆ๋ง ์๊ฐ ๊ธฐ์ (ch.9)
-์ ํ๋ฆผ Hypotaxy of Wafer-scale single-crystal transition metal dichalcogenides ย Nature
-๊ณ ์์ Strain-Induced 2H to 1T' Phase Transition in suspended MoTe2 using Electric Double layer Gating ย ACS Nano
(26/01/30)
-ํ์์ Se-vacancy-healing-with-substitutional-oxygen-in-WSe2-for-high-mobility-p-type-field-effect-transistors ACS Nano
-์ ์ฑ์ฐ Engineering the resistive switching properties of 2D WS2 memristor: role of band gap Journal of Materials Science: Materials in Electronicsย
(26/01/23)
-๊ณ ๋ฏผ๊ฒฝ ๋ฐ์ฌ ํ๋ผ์ฆ๋ง ์๊ฐ ๊ธฐ์ (ch.8)
-๋ณ์์ง A review of polymethyl methacrylate (PMMA) as a versatile lithographic resistโ With emphasis on UV exposure Microelectronic Engineeringย
(26/01/16)
-๊ฐ๋ฏผ์ง Deriving Optimal atomic layer deposition process conditions using maching learning Journal ofย Industrial Information Integration
-์ฌํ์ฐ Inherently area-selective atomic layer deposition for the fabrication of 2D and 3D Nanostructures Applied Surface Scienceย
(26/01/09)