주1. Investigating the impact of oxygen surface plasma treatments on the structural and electrical properties of Graphene (Applied Science and Convergence Technology 2024)

주2. Machine Learning based on Digital Image Colorimetry driven In-situ, Non-contact Plasma Etch Depth Prediction (arXiv, Advanced Intelligent System 2025)

주3. Machine Learning-enabled in-situ diagnostic for intelligence for plasma based semiconductor manufacturing: A Review (ACS Applied Materials & Interfaces 2026)

주4. Atomic-Layer-Resolved Etching Mechanism of Wafer-Scale 6-in WS₂ Grown by Metal-Assisted PECVD (Preparation, 2026) Invited

주5. Deterministic 1T/2H Phase Patterning in PECVD-Grown WS₂ with Wafer-Scale Spatial Control (Preparation, 2026) Invited

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공1. Plasma and Gas based Semiconductor Technologies for 2D Materials with Computational Simulation & Electronic Applications (Advanced Electronic Materials 2024)

공2. Multi-Domain Data Integration for Plasma Diagnostics in Semiconductor Manufacturing using Tri-CycleGAN (Journal of Sensor and Actuator Network 2024)   

공3. Data-Driven  Approaches for Understanding and Optimizing High-Temperature Fluorocarbon Plasma Process (Sensor 2024)  

공4. Direct Monitoring of Generated Particles in Plasma Enhanced Chemical Vapor Deposition Process using Temperature Compensating Quartz Crystal Microbalance Measurement (Sensors and Actuator A: Physical 2025)

공5.  Strain-Assisted Large-Scale 1T-MoS2 Synthesis and its Optical Synaptic Flash Memory Applications (Small Method 2025)

공6.  Doping and Passivation Effects in Transition Metal Dichalcogenides via HfO2 Thin Film Deposition (Electronic Materials Letters 2025)

공7. Designable van der Waals Crystal for Artificial Neuronal Cell Mimicking (Advanced Materials 2026)

공8. D-Optimal Augmentation of OFAT datasets for Machine Learning-Based Thickness Prediction in HfO2 PEALD (Under Review, Applied Surface Science 2026)

공9. Homostructural van der Waals dielectric capacitors via nanoscale domain engineering (Under Review, Advanced Materials 2026)

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특허1. 플라즈마 공정의 종료시점 감지 계측시스템 (출원KR 10-2024-0071155 2024)

특허2. DIC와 OES 복합 진단을 통한 머신러닝 기반 ONO공정 종료 시점 파악 장치 및 방법 (출원KR 10-2025-0081962 2025)

특허3. CycleGAN 모델 기반 플라즈마 광진단 정확도 개선 장치 및 방법 (출원KR 10-2025-0081963 2025)

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학회1. 2023.08.20-23 한국진공학회_포스터

학회2. 2024.05.22-24 KCSDT2024_포스터

학회3. 2024.07.24 KIMM학술제_포스터

학회4. 2024.08. 한국진공학회_구두

학회5. 2024.11 ISNTP_포스터 (국제)

학회6. 2024.11 대한기계학회_구두

학회7. 2025.02 한국진공학회_구두

학회8. 2025.04 대한기계학회 열공학춘계_구두

학회9. 2025.05 한국반도체디스플레이기술학회_포스터

학회10. 2025.11 한국표면분석학회_구두 '은상'

학회11. 2025.11 대한전자공학회_구두 (특별세션)

학회12. 2026.02.08 한국진공학회_구두

학회13. 2026.11.29 MRS_국제구두

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수상1. 한국진공학회 학부생포스터 발표상 (2023)

수상2. 제10회 KSME-SEMES 오픈 이노베이션 챌린지-장려상 (2025)

수상3. 제4회 한국표면분석학회-우수구두 발표상 '은상' (2025)

주1. Physically Validated, Image-Based Machine Learning for End-Point Detection and Layer-Resolved Thickness Prediction in Multilayer Plasma Etching (Submitted, Small 2026)

주2. Adaptive Hybrid Modeling for Process Parameter-Based Endpoint Detection under Data Imbalance in Plasma Etching (Under Review, Vacuum 2026)

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공1. Machine Learning based on Digital Image Colorimetry driven In-situ, Non-contact Plasma Etch Depth Prediction (arXiv & Advanced Intelligent System 2025)

공2. Explainable Integration of Process and Optical Parameters for Plasma Etch Depth Prediction (Journal of Vacuum Science & Technology A 2026)

공3. Designable van der Waals Crystal for Artificial Neuronal Cell Mimicking (Advanced Materials 2026)

공4. Machine Learning-enabled in-situ diagnostic for intelligence for plasma based semiconductor manufacturing: A Review  (ACS Applied Materials & Interfaces 2026)

공5. D-Optimal Augmentation of OFAT datasets for Machine Learning-Based Thickness Prediction in HfO2 PEALD (Under Review, Applied Surface Science 2026)

공6. Homostructural van der Waals dielectric capacitors via nanoscale domain engineering (Under Review, Advanced Materials 2026)

공7. Atomic-Layer-Resolved Etching Mechanism of Wafer-Scale 6-in WS₂ Grown by Metal-Assisted PECVD (Preparation, 2026)

공8. Deterministic 1T/2H Phase Patterning in PECVD-Grown WS₂ with Wafer-Scale Spatial Control (Preparation, 2026)

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학회1. 2026.04.22-25 대한기계학회 열공학부문_포스터

학회2. 2026.06.29-07.01 ASBFP & I-YES_영어구두

학회3. 2026.08.23-27 한국진공학회_영어구두

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수상1. The 3rd ASBFP & I-YES 2026, Best Presentation Award

주1. 6-in Patterned SiO2 etching thickness prediction by DIC (Preparation, 2026) 

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공1. Machine Learning-enabled in-situ diagnostic for intelligence for plasma based semiconductor manufacturing: A Review  (ACS Applied Materials & Interfaces 2026)

공2. D-Optimal Augmentation of OFAT datasets for Machine Learning-Based Thickness Prediction in HfO2 PEALD (Under Review, Applied Surface Science 2026)

공3. Physically Validated, Image-Based Machine Learning for End-Point Detection and Layer-Resolved Thickness Prediction in Multilayer Plasma Etching (Submitted, Small 2026)

공4. Adaptive Hybrid Modeling for Process Parameter-Based Endpoint Detection under Data Imbalance in Plasma Etching (Under Review, Vacuum 2026)

공5. Atomic-Layer-Resolved Etching Mechanism of Wafer-Scale 6-in WS₂ Grown by Metal-Assisted PECVD (Preparation, 2026)

공6. Deterministic 1T/2H Phase Patterning in PECVD-Grown WS₂ with Wafer-Scale Spatial Control (Preparation, 2026)

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학회1. 2026.04.22-25 대한기계학회 열공학부문_포스터

학회2. 2026.06.29-07.01 ASBFP & I-YES_영어구두

학회3. 2026.08.23-27 한국진공학회_영어구두

주1. Investigation of Rotating Arc‑Catalytic Reactor for CF4 Removal with High Energy Efficiency (Plasma Chemistry and Plasma Processing 2022)

주2. CF4 제거를 위한 유동층 반응기를 이용한 열 플라즈마-촉매 스크러버의 특성 연구 (대한기계학회 논문집 B 2022)

주3. First-Principles Calculation guided High-Purity Layer Control of 4-inch MoS2 by Plasma RIE (Chem. Mater. 2023) Cover

주4. Domain transformation for missing-modality generation and performance comparison in SiO2 etch depth prediction (Preparation, Journal of Mechanical Science and Technology 2026)

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공1. Effects of a baffle and H2 injection on methane combustion in a turbulent fluidized bed (Fuel 2022)

공2. Development of an induction heating reactor for rapid catalytic CF4 decomposition (Journal of Industrial and Engineering Chemistry 2024)

공3. Explainable Integration of Process and Optical Parameters for Plasma Etch Depth Prediction (Journal of Vacuum Science & Technology A 2026)

공4. Experimental investigation of discharge characteristics in AC-driven rotating arc plasma for ammonia decomposition (Fuel Processing Technology 2026)

공5. Sustainability assessment of electrified naphtha cracking pathways for carbon-neutral ethylene production (Journal of Cleaner Production 2026) 

공6. Machine Learning-enabled in-situ diagnostic for intelligence for plasma based semiconductor manufacturing: A Review  (ACS Applied Materials & Interfaces 2026)

공7. D-Optimal Augmentation of OFAT datasets for Machine Learning-Based Thickness Prediction in HfO2 PEALD (Under Review, Applied Surface Science 2026)

공8. Physically Validated, Image-Based Machine Learning for End-Point Detection and Layer-Resolved Thickness Prediction in Multilayer Plasma Etching (Submitted, Small 2026)

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학회1. 2026.06.29-07.01 ASBFP & I-YES_구두

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특허1. 유동층 연소장비 (등록 10-2371679 2022)

특허2. 유동층 촉매 스크러버 (등록 10-2485993 2023)

특허3. 흡탈착식 유동층 반응기를 포함한 스크러버 장비 (등록 10-2564047 2023)

특허4. 유동층 연소 반응기 (등록 10-2576188 2023)

특허5. Catalyst regenetator (등록 US 11279885 2022)

특허6. 부식 평가 시스템 (출원 10-2025-0201683 2025) 삼성EHS 공동출원

특허7. 배관 평가 장치 및 이를 포함하는 기판 처리 시스템 (출원 10-2025-0201707 2025) 삼성EHS 공동출원

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기술이전1. CPOx technology, Kellogg Brown & Root.

주1. Ignition Process of Diesel Spray Based on Behavior of Rotating Gliding Arc in Plasma Reformer (Plasma Chem. Plasma Process 2021)

주2. Characterization of gliding arc discharge using H2/Ar gas mixture (International Journal of Hydrogen Energy 2025)

주3. Characteristics of Direct CF4 Decomposition in the Arc Discharge Region using a Hollow Plasma Torch (Submitted, ACS ES&T Engineering 2026)

주4. Domain transformation for missing-modality generation and performance comparison in SiO2 etch depth prediction (Preparation, Journal of Mechanical Science and Technology 2026)

주5. 6-in Patterned SiO2 etching thickness prediction by DIC (Preparation, 2026) 

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공1. Energy efficient dry reforming process using low temperature arcs (Plasma Processes and Polymers 2018)

공2. Evaluation of the thermal effect of arc plasma in the plasma-driven partial oxidation of octane (Plasma Processes and Polymers 2020)

공3. Variations of methane conversion process with the geometrical effect in rotating gliding arc reactor (International Journal of Hydrogen Energy 2020)

공4. Plasma jet assisted carbonization and activation of coffee ground waste (Environment International 2020)

공5. A novel energy efficient path for nitrogen fixation using a non-thermal arc (RSC Advances 2021)

공6. Plasma Catalyst-Integrated System for Ammonia Production from H2O and N2 at Atmospheric Pressure (ACS Energy Letters 2021) 

공7. Development of hydrogen-based high enthalpy plasma generator applicable for reentry simulation of the ice giant planets (Under Review, Aerospace Science and Technology 2026)

공8. D-Optimal Augmentation of OFAT datasets for Machine Learning-Based Thickness Prediction in HfO2 PEALD (Under Review, Applied Surface Science 2026)

공9. Physically Validated, Image-Based Machine Learning for End-Point Detection and Layer-Resolved Thickness Prediction in Multilayer Plasma Etching (Under Review, Small 2026)

공10. Adaptive Hybrid Modeling for Process Parameter-Based Endpoint Detection under Data Imbalance in Plasma Etching (Submitted, 2026)

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학회1. 2026.06.29-07.01 ASBFP & I-YES_구두

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특허1. Catalyst regenetator (등록 US 11279885 2022)

특허2. 다중 헤드 플라즈마 반응 장치 (등록 KR 10-2232804-000 2021)

특허3. Catalyst regenerator (출원 KR 10-2026-0012059 2026)

주1. Sequential Infiltration Synthesis with Organic Co-reactants for Extensively Swollen Organic–Inorganic Hybrid Thin Films (ACS Applied Polymer Materials 2023) Cover

주2. A new nanoparticle heterostructure strategy with highly tunable morphology via sequential infiltration synthesis (Applied Surface Science 2022)

주3. Boosting Electrochemical Activity of Porous Transparent Conductive Oxides Electrodes Prepared by Sequential Infiltration Synthesis (Small 2022) Cover

주4. Breaking the Dose Barrier in PMMA: Metal Oxide–Induced Hybrid Strategy for Negative-Tone Lithography (Applied Surface Science Advances 2026)

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공1. Transient, Reusable Top-Coats for the Vertical Orientation of High-χ Block Copolymers for Nano Patterning (ACS Applied Nano Materials 2023)

공2. Understanding Physicochemical Mechanisms of Sequential Infiltration Synthesis toward Rational Process Design for Uniform Incorporation of Metal Oxides (Sensors 2022) 

공3. Explainable Integration of Process and Optical Parameters for Plasma Etch Depth Prediction (Journal of Vacuum Science & Technology A 2026)

공4. Machine Learning-enabled in-situ diagnostic for intelligence for plasma based semiconductor manufacturing: A Review  (ACS Applied Materials & Interfaces 2026)

공5. D-Optimal Augmentation of OFAT datasets for Machine Learning-Based Thickness Prediction in HfO2 PEALD (Under Review, Applied Surface Science 2026)

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수상1. 대한금속, 재료학회 추계학술대회-포스터 발표 우수상 (2021)

수상2. 한국현미경학회 추계학술대회 우수포스터상 (2022)

수상3. CNU graduate fair 2022 포스터 최우수상 (2022)

주1. Strain‐Assisted Large‐Scale 1T‐MoS2 Synthesis and its Optical Synaptic Flash Memory Application (Small Method 2025)

주2. Over 1011-fold variability for a base-12 PUF using particle-damaged graphene (Device 2025)

주3. Vertically Aligned TiS₂ Adhesion Layers via Plasma-Induced Metal Sulfidation and Two-Terminal Device Application (ACS Applied Materials & Interfaces 2025)

주4. Programmable Magneto-ionic effects in multi-ferroic van der Waals heterostructure (Transferred 2026)

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공1. Free-standing two-dimensional ferro-ionic memristor (Nature Communications 2024)

공2. Ultrastable 3D Heterogeneous Integration via N-Heterocyclic Carbene Self-Assembled Nanolayers (ACS Applied Materials & Interfaces 2024)

공3. Stochastically Broken Inversion Symmetry of Van der Waals Topological Insulator for Nanoscale Physically Unclonable Functions (Advanced Materials 2025)

공4. Artificial Room‐Temperature Ferromagnetism of Bulk van der Waals VSe2 (Advanced Science 2025)

공5. Monolithically-integrated van der Waals Synaptic Memory via Bulk Nano-crystallization  (Advanced Science 2025)

공6. Multi-scale computational approach to understand plasma assisted sulfidation for growth mechanism of MoS2 (Chemical Engineering Journal 2025)

주1. Domain transformation for missing-modality generation and performance comparison in SiO2 etch depth prediction (Preparation, Journal of Mechanical Science and Technology 2026)

주2. 6-in Patterned SiO2 etching thickness prediction by DIC (Preparation, 2026) 

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공1. Synthesis of Nitrogen Oxides in Atmospheric-pressure electrodeless microwave plasmas: Experiments and reactor network modelling (Journal of Environmental Chemical Engineering 2026)

공2. Atmospheric-pressure microwave plasma reforming of ethane-carbon dioxide mixtures (Journal of CO2 Utilization 2024)

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학회1. 2026.02.08-11 한국진공학회_구두