주1. Effect of elastomer characteristics on fiber optic force sensing performance in bio-medical robotics applications(J. Mech. Sci. Technol. 2018)

주2. Development of a Single Particle Sizing System for Monitoring Abrasive Particles in Chemical Mechanical Polishing Process (J. Mech. Sci. Technol. 2022)

주3. First-Principles Calculation guided High-Purity Layer Control of 4-inch MoS2 by Plasma RIE (Chem. Mater. 2023) Cover

주4. Machine learning based prediction of atomic layer control for MoS2 via Reactive Ion etcher (Appl. Sci. Converg. Technol. 2023) Cover, Paper Award

주5. Plasma and Gas based Semiconductor Technologies for 2D Materials with Computational Simulation & Electronic Applications (Adv. Electron. Mater. 2024)

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공1. Optical contact force monitoring sensor for cardiac ablation catheters (Optick 2016)

공2. Concurrent and Selective Determination of Dopamine and Serotonin with Flexible WS2/Graphene/Polyimide Electrode using Cold Plasma (Small 2021) Cover

공3. Chromism-integrated Sensors and Devices for Visual Indicators (Sensors 2022)

공4. Environmentally friendly buff cleaning of ceria nanoparticles using bubbles in gas-dissolved water (Colloids surf. A: Physicochem. Eng. Asp. 2023)

공5. Multi-Domain Data Integration for Plasma Diagnostics in Semiconductor Manufacturing using Tri-CycleGAN (Journal of Sensor and Actuator Network 2024)  

공6. Machine Learning based on Digital Image Colorimetry driven In-situ, Non-contact Plasma Etch Depth Prediction (arXiv, Advanced Intelligent System 2025) 

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수상1. Best Paper Award, Appl. Sci. Converg. Technol. (2023) 

주1. Multi-Domain Data Integration for Plasma Diagnostics in Semiconductor Manufacturing using Tri-CycleGAN (Journal of Sensor and Actuator Network 2024)  

주2. Machine Learning based on Digital Image Colorimetry driven In-situ, Non-contact Plasma Etch Depth Prediction (arXiv & Advanced Intelligent System 2025)

주3. Machine Learning-enabled in-situ diagnostic for intelligence for plasma based semiconductor manufacturing: A Review (ACS Applied Materials & Interfaces 2026)

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공1. Plasma and Gas based Semiconductor Technologies for 2D Materials with Computational Simulation & Electronic Applications (Advanced Electronic Materials 2024)

공2. Data-Driven  Approaches for Understanding and Optimizing High-Temperature Fluorocarbon Plasma Process (Sensor 2024)  

공3. Direct Monitoring of Generated Particles in Plasma Enhanced Chemical Vapor Deposition Process using Temperature Compensating Quartz Crystal Microbalance Measurement (Sensors and Actuator A: Physical 2025)

공4. Uncertainty quantification and parameter optimization of plasma etching process using heteroscedastic Gaussian process (arXiv & Engineering Optimization 2026)

공5. Physically Validated, Image-Based Machine Learning for End-Point Detection and Layer-Resolved Thickness Prediction in Multilayer Plasma Etching (Under Review, Small 2026)

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특허1. 플라즈마 공정의 종료시점 감지 계측시스템 (출원KR 10-2024-0071155 2024)

특허2. DIC와 OES 복합 진단을 통한 머신러닝 기반 ONO공정 종료 시점 파악 장치 및 방법 (출원KR 10-2025-0081962 2025)

특허3. CycleGAN 모델 기반 플라즈마 광진단 정확도 개선 장치 및 방법 (출원KR 10-2025-0081963 2025)

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학회1. 2024.01.15-18 ICMAP2024_포스터

학회2. 2024.02.14-16 한국진공학회 동계_포스터

학회3. 2024.05.22-24 KCSDT2024_포스터 '우수포스터상'

학회4. 2024.07.24 KIMM학술제_포스터

학회5. 2024.08 한국진공학회_구두

학회6. 2024.11 ISNTP_포스터 (국제)

학회7. 2024.11 대한기계학회_구두

학회8. 2025.02 한국진공학회_구두

학회9. 2025.04 대한기계학회 열공학춘계_구두

학회10. 2025.05 한국반도체디스플레이기술학회_구두

학회11. 2025.08 한국진공학회_구두

학회12. 2026.02.08-11 한국진공학회_구두

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수상1. KCSDT2024 우수포스터상 (2024)

수상2. 제10회 KSME-SEMES 오픈 이노베이션 챌린지-은상 (2025)

수상3. 제10회 KSME-SEMES 오픈 이노베이션 챌린지-장려상 (2025)

주1. Strain‐Assisted Large‐Scale 1T‐MoS2 Synthesis and its Optical Synaptic Flash Memory Application (Small Method 2025)

주2. Over 1011-fold variability for a base-12 PUF using particle-damaged graphene (Device 2025)

주3. Vertically Aligned TiS₂ Adhesion Layers via Plasma-Induced Metal Sulfidation and Two-Terminal Device Application (ACS Applied Materials & Interfaces 2025)

주4. Programmable Magneto-ionic effects in multi-ferroic van der Waals heterostructure (Transferred 2026)

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공1. Free-standing two-dimensional ferro-ionic memristor (Nature Communications 2024)

공2. Ultrastable 3D Heterogeneous Integration via N-Heterocyclic Carbene Self-Assembled Nanolayers (ACS Applied Materials & Interfaces 2024)

공3. Stochastically Broken Inversion Symmetry of Van der Waals Topological Insulator for Nanoscale Physically Unclonable Functions (Advanced Materials 2025)

공4. Artificial Room‐Temperature Ferromagnetism of Bulk van der Waals VSe2 (Advanced Science 2025)

공5. Monolithically-integrated van der Waals Synaptic Memory via Bulk Nano-crystallization  (Advanced Science 2025)

공6. Multi-scale computational approach to understand plasma assisted sulfidation for growth mechanism of MoS2 (Chemical Engineering Journal 2025)

주1. Monolithically-Integrated van der Waals Synaptic Memory via Bulk Nano-Crystallization (Advanced Science 2025)

주2. Fundamental and Technical Advances in Bulk Photovoltaics of 2D van der Waals Materials (Nanoscale Horizons 2026)

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공1. Multi-scale computational approach to understand plasma assisted sulfidation for growth mechanism of MoS2 (Chemical Engineering Journal 2025)

공2. Strain-Assisted Large-Scale 1T-MoS2 Synthesis and its Optical Synaptic Flash Memory Application (Small Method 2025)

공3. Vertically Aligned TiS2 Adhesion Layers via Plasma-Induced Metal Sulfidation and Two-Terminal Device Application (ACS Applied Materials & Interfaces 2025)

공4. Artificial Room‐Temperature Ferromagnetism of Bulk van der Waals VSe2 (Advanced Science 2025)

공5. Stochastically Broken Inversion Symmetry of Van der Waals Topological Insulator for Nanoscale Physically Unclonable Functions (Advanced Materials 2025)

공1. Machine Learning based on Digital Image Colorimetry driven In-situ, Non-contact Plasma Etch Depth Prediction (arXiv, Advanced Intelligent System 2025)

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특허1. DIC와 OES 복합 진단을 통한 머신러닝 기반 ONO공정 종료 시점 파악 장치 및 방법 (출원KR 10-2025-0081962)

특허2. CycleGAN 모델 기반 플라즈마 광진단 정확도 개선 장치 및 방법 (출원KR 10-2025-0081963)