AI integrated Plasma System for 2D TMDc
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[6-in. 지능형 PECVD]
Model: AFS-IC6T
Company: Allforsystem
ICP-Plasma Enhanced Chemical Vapor Deposition (PECVD)-OES
Source: H2S, H2, CF4, SiH4
[Link]
[6-in. 지능형 RIE]
Model: RAINBOW 4420
Company: Lam Research
Reactive Ion Etcher (RIE)-OES
Dual ICP type
Gas: O2, CF4, Ar, NF3
LoT vacuum 2 EA
Insulator (PECVD, ALD) & Metal (Sputter) deposition
[4-in. SPUTTER]
Model: 24EIS06
Company: 이아이 Technology
RF & DC Magnetron Sputtering System (1 DC, 2 RF)
온도컨트롤러: NOVA500
Gas: N2, O2, Ar
ETC Plasma (CCP, RPS) & Utility (chiller, scrubber, cabinet)
[H2, SiH4, H2 Gas Cabinet]
Model: EGS-S-01
Company: EG solution
For ICP-PECVD
[Dry Gas Scrubber]
Model: CD540S
Company: EG solution
For ICP-PECVD
[Chiller]
Company: 이아이(EI)
30 L/min, 20 L
PECVD용 1 EA
Sputter용 1 EA
[Vacuum Desiccator]
Company: Customized desiccator
Wafer samples 보관용
4 EA
Plasma diagnosis machines (QMS, ToF-MS, OES) for AI
Materials Chractrization (Ellipsometer, AFM, Contact angle)
[AFM]
Model: NX-1
Company: Park Systems
[AFM]
Model: NX-10
Company: Park Systems
50 um X-Y Scanner
CCD (1.2 M Pixel)
Module option:
KPFM
Variable Enhanced Conductive AFM (VECA)
Ultra low-noise conductive AFM (ULCA)
Plasma elctronical diagnosis (Oscilloscope, Langmuir Probe, Network Analyzer)
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