Controlled MoS2 layer etching using CF4 plasma
Nanotechnology (2015)
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First-Principles Calculation Guided High-Purity Layer Control of 4 in. MoS2 by Plasma RIE
Chemistry of Materials (2023)
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First-Principles Calculation Guided High-Purity Layer Control of 4 in. MoS2 by Plasma RIE
Chemistry of Materials (2023)