The Ossila Dip Coater offers programmable and precise control of dipping parameters, enabling high reproducibility across sample batches. One of the most critical parameters in our applications is the immersion speed and concentration of the precursor, which directly influences the thickness, homogeneity, and adhesion of the resulting thin films. In our experiments, immersion speeds are carefully optimized depending on the solution viscosity and target film properties. The system allows adjustment of immersion and withdrawal speeds, typically in the range of 0.1 to 10 mm/s, and supports programmable immersion time, drying intervals, and number of cycles, making it suitable for multilayer film fabrication. It is compatible with various solution types, including for example Langmuir-type metal stearate solutions, and accommodates a range of substrate sizes. This level of control is essential for producing uniform, high-quality films which are used in the development of structured materials.

In our group, the Ossila Dip Coater is actively used to produce thin films from Langmuir-type solutions containing stearates as precursors. These films are currently being investigated as part of a broader effort to develop layered Transition Metal Oxides (TMOs) with potential applications in opto-electronic devices, semiconductors and functional coatings. The controlled deposition process ensures consistent film morphology and composition, which are key to achieving reliable device performance and reproducible experimental results.

Our latest research is currently under consideration for publication.