Thermal evaporation furnaces are essential tools for the controlled growth of oxide-based micro- and nanostructures. Their core function is to provide a high-temperature environment where solid precursors are evaporated and transported in vapor form, enabling their condensation and crystallization on selected substrates. By adjusting parameters such as temperature, atmosphere, and growth conditions, researchers can tune the morphology, composition, and properties of the resulting materials. The fundamental principle relies on the transformation of solids into vapor at elevated temperatures, followed by their deposition through two main mechanisms: Vapor–Solid (VS), where species condense directly on the substrate, and Vapor–Liquid–Solid (VLS), where a liquid catalyst droplet guides anisotropic growth such as nanowires. Both processes are governed by thermodynamic and kinetic factors that ultimately define the structure and quality of the material. Why they are important: Thermal evaporation furnaces enable the synthesis of advanced functional oxides with tailored optical and electronic properties, opening pathways for new devices in optoelectronics, sensing, and power applications. At the same time, they provide a versatile platform to investigate fundamental growth mechanisms, phase stability, and defect formation. In this way, thermal evaporation furnaces serve not only as practical synthesis tools but also as key instruments for discovering and engineering the next generation of functional materials.
The FINE group operates a customized Hobersal thermal evaporation furnace, specifically designed to provide highly controlled growth conditions for oxide-based materials. In addition, the laboratory is equipped with a second, smaller Hobersal furnace, capable of reaching up to 1150 °C while sharing the same operational features as the main system. Their main capabilities include:
High-temperature operation: the customized furnace reaches up to 1500 °C, while the smaller unit operates up to 1150 °C, enabling the evaporation and crystallization of a wide range of oxide and metallic precursors.
Programmable heating profiles: both furnaces allow multi-step ramping and cooling sequences, with adjustable rates from approximately 10 °C/hour (minimum practical value) up to 900 °C/hour, offering flexibility for both delicate and rapid thermal processes.
Atmosphere control: the chambers can be isolated to operate under low-vacuum conditions or filled with controlled gas atmospheres such as nitrogen or argon, depending on the requirements of the growth process.
Gas flow regulation: both systems are equipped with a manometer that enables precise control of the gas flow, with a resolution of 0.25 L/min, ensuring reproducible experimental conditions.
Our thermal evaporation furnaces are central to our research on oxide nanostructures.
Using this method, we showed how Sn and Cr impurities influence the morphology and optical properties of Ga₂O₃, Sb₂O₃, and Zn₂GeO₄ nanostructures, enabling applications in optical microcavities and sensing devices. López et al (2016)
We also synthesized undoped and Al-doped TiO₂ micro- and nanostructures, demonstrating how dopants affect phase transitions, defect structures, and luminescence, with relevance for photocatalysis and optoelectronics. Vásquez et al (2018)
Video illustrating the growth of a cluster of Ga₂O₃ micro- and nanostructures in the furnace during a 15-hour treatment at 1500 °C.