Authors: Atsunobu Une, Toshio Kawanishi
Publication Year: 2010, Nikkan Kogyo Shimbun
Table of Contents
Chapter 1: Characteristics of Polishing Processes
Chapter 2: Basic Configuration of Polishing Equipment
Chapter 3: Fundamentals of Polishing Theory
Chapter 4: Analysis of Polishing Motion
Chapter 5: Analysis of Polishing Pressure
Chapter 6: Characteristic Measurement of Parameters Necessary for Simulation
Chapter 7: Verification of Simulations of Various Polishing Methods
Authors: Toshio Kawanishi, Nobuo Yasunaga
Publication Year: 2010, Nikkan Kogyo Shimbun
Table of Contents
Part I: Processing Equipment
Lapping and Polishing, Mechanochemical Polishing, Chemical and Mechanical Polishing, Film Polishing and Belt Polishing
Part II: Tools and Equipment
General Abrasives, Superabrasives, Polishing Fluids, Slurries, Polishing Pads, Pad Dressings, Grinding Wheels, Polishing Equipment, CMP Equipment
Part III: Case Studies
Authors: Toshiro Doi, Toshio Kawanishi, Takeo Nakagawa
Publication Year: 1998, Kogyo Chosakai
Table of Contents
Chapter 1: General Overview - The Role of CMP in Next-Generation LSI Processes -
Chapter 2: Ultra-Precision Machining Technology and the Fundamentals of CMP - The Positioning of CMP and the Mechanism of CMP Machining -
Chapter 3: Elemental Technologies of CMP
Chapter 4: Application Examples to Devices
Chapter 5: The Future of CMP
Authors: Shigeki Okuyama, Atsunobu Une, Akinori Yui, Hirofumi Suzuki
Publication Year: 2013, Corona Publishing Co.
Table of Contents:
Chapter 1: Overview
Chapter 2: Mechanical and Thermal Properties of Metallic Materials
Chapter 3: Cutting Processes
Chapter 4: Grinding Processes
Chapter 5: Polishing Processes