Plasma Matrix

bdiscom Plasma Matrix

Referente: Federica Celegato

Available Processes:

• Plasma activation
• Plasma etching
• SEM and TEM sample preparation
• Fine cleaninc of high precision mechanical parts

Cleaning Procedures:

• Perform Cleaning Recipe before every use
• RECIPE 1 with gas lines closed (black valves closed on gas panel)

Key Features and Accessories:

• Stainless steel process chamber L=120mm D 220mm
• Distance sample older to electrode 87 mm
• Sample holder 110 x 210mm
• Front sample door with handholder
• Built in 10 to 200 W RF generator fully protected
• Variable matching network mounted on the chamber
• Process gas regulation by 2 massflow controllers for gas mixture
• Pressure measurement by a Pirani gauge
• Power supply single phase 95-250Vac, 50 or 60 Hz
• Full microprocessor control. User interface LCD touch screen display 256 x 128 pixel
• CE Mark
• Gas compatibility: air, oxygen, nitrogen, argon, trifluoromethane (CHF3) and in general all non corrosive gases
• Contact Bdiscom for further information

Processes Procedures:

• RECIPE 2 --> Copolymers
• RECIPE 3 --> Lamellae cleaning
• RECIPE 4 --> Graphene
• RECIPE 5 --> Sphere reduction
• RECIPE 6-9 --> User Free
• For processes with O2 invite Roberto (r.rocci@inrim.it) and specify in the booking that oxygen is needed