E-beam telemark

Available Processes:

• Evaporation of metals such as Al, Ag, Au, AuPd, Ti, Cu, Ge.

Key Features and Accessories:

• Sample tilting with half a degree resolution
• Oxygen line for in-situ oxidation (static pressure, Load-Lock)
• Oxygen line for in-situ evaporation of Ti oxides (static pressure, dep. chamber)

Key Specifications:

• Working pressure: 10-6 to 10-9 mbar
• Substrate temperature: Room temperature
• Deposition rate: 0.1 - 2 nm/s
• Pumping time needed: ~60 min

Allowed Materials:

• Al, Ag, Au, AuPd, Ti, Cu, Ge.

Forbidden Materials:

• Magnetic materials