Professor

2005 - current : Dept. of Chemical and Biomolecular Engineering, Yonsei University
(2018 - 2019) : Courtesy Professor, School of Chemical, Biological and Environmental Engineering, Oregon State University
(2011 - 2012) : Visiting Professor, Mechanical and Aerospace Engineering Department, UCLA

2001 - 2005 : Principal Staff Scientist at Digital DNA Laboratories, Motorola / Freescale Semiconductor

1998 - 2000 : Postdoctoral Researcher, Dept. of Electrical Engineering & Chemistry, Stanford University

1995 - 1998 : Ph.D. in Chemical Systems Engineering, University of Tokyo

1992 - 1995 : M.S. in Chemical Engineering, Yonsei University

1987 - 1992 : B.S. in Chemical Engineering, Yonsei University

Prof. Sangwoo Lim received his Ph.D. in Chemical System Engineering from the University of Tokyo, Tokyo, Japan in 1998 and B.S. and M.S. degrees in Chemical Engineering from Yonsei University, Seoul, Korea in 1992 and 1995, respectively.

He was a postdoctoral research associate at the Dept of Electrical Engineering and Dept. of Chemistry at Stanford University in 1998-2000. He worked on several projects such as silicon wafer surface cleaning and ozonated water photoresist stripping process in the International SEMATECH and the NSF/SRC Engineering Research Center for Environmentally Benign Semiconductor Manufacturing.

He was a Principal Scientist at Freescale Semiconductor (formerly Semiconductor Product Sector of Motorola) in 2001-2005. His main responsibility and accomplishments were to launch the plasma nitrided oxide integration technology with surface preparation optimization to reduce gate leakage current density with EOT scaling down of CMOS 90 and 65 gate stacks.

He has been a professor at the Department of Chemical and Biomolecular Engineering, Yonsei University (Seoul, Korea) since 2005. Prof. Lim’s major research interest is to develop various chemical processes to fabricate semiconductor, photovoltaic, and nano devices. His representative research projects are: Ge surface preparation, III-V semiconductor surface preparation, selective Si₃N₄/SiO₂ etchant development, Highly ion implanted photoresist stripping process, selective Al₂O₃/La₂O₃ etching process on HfSiO and HfSiON High-K gate stacks, Ru-capped EUV photomask fabrication and cleaning, MoSiON PSM fabrication and cleaning, etc. He has authored over 150 journal and conference papers.

Currently Prof. Lim is an Organizer of the International Symposium on Semiconductor Cleaning Science and Technology, committee member of Korean CMP User's Group Meeting, committee member of Korea Semiconductor Cleaning User's Group Meeting, and SEMI KOREA SPS committee.

He is also the founder and CEO of ChemArTech.

In his spare time, Prof. Lim enjoys soccer (watching and playing) and music.