Research field
ALD process
Silicon-nanowire FETs
Oxide semiconductor (Cu2O)
2D material devices modeling & characterization (MoS2, WSe2 etc.)
Research field
a-IGZO TFTs
Device fabrication/characterization
Post-annealing technique
Modeling & characterization
Undergraduate (Intern)
-2025-
κ°λ³ν, κ³ μ±μΌ, κ³ μμ’ , κ³ νμ, κΉλ²κΈ°, κΉμλ, κΉμ§μ±, λ°λμ, λ°μ€ν¬, λ°±λ―Όκ·, μ κ΄μ, μμ£Όν¬, μ΄μ¬ν, μ΄μ±μ°, μμμ, μ 보λΌ
-2024-
κΆμμΈ, κΉμμ°, κΉμμ€, κΉν¨κ²½, λ Έμ μ€, λ°°μ§μ, μλν, μ΄κ·ν, μ΄μ μ, μ΄μ μ , μ‘°μμ
-2023-
μ‘μ¬μ, μ λͺ μ§, μ νμ°, μ΄μ±μ΄, μμμ, μ₯λ―Όμ°, μ‘°μλ