[14] HyungJun Kim, Tae Hun Jeon, Jong Kyung Park, Min Ju Kim*, ""Plasma-Free Wafer-Level Hybrid Bonding Using iCVD Polymer Thin Film for Feasible 3D Multi-Chip Integration" 2026 IEEE 76th Electronic Components and Technology Conference, 2026/05/26-29
[13] HyungJun Kim, Tae Hun Jeon, Jong Kyung Park, Min Ju Kim*, "Short-Time, Plasma-Free Bonding at Low Temperature via Epoxy-Functional iCVD Films for Feasible 3D Multi-Chip Integration" 2026 MRS Spring Meeting , 2026/04/25-30
[12] Tae Won Park, Ji In Kim, Min Ju Kim*, "Modeling of Conductive Filament Behaviors in Hybrid Polymeric Ultra-Thin Films via initiated Chemical Vapor Deposition Process" 2025 KJF-ICOMEP, 2025/08/26-28
[11] Hyung Jun Kim, Tae Won Park, Sang Hyeok Han, Min Ju Kim*, "Room-Temperature Hybrid Bonding for 3D Memory Stacking by Using iCVD-Deposited Polymer Films" 2025 KJF-ICOMEP, 2025/08/26-28
[10] Min Ju Kim*, "Functional Polymeric Thin Films via iCVD Process for Advanced BEOL/PKG in Semiconductor" GCIM 2025 & MRS-K Spring Meeting, 2025/06/15-19 (Invited)
[9] Taehoon Kim, Min Ju Kim*, "Advancing Neuromorphic Synapse : Flexible, High integrated Charge Trap Hybrid Organic/Inorganic Non-volatile Memory Devices" 2024 Wiley Forum Fall, 2024/10/11 (Invited)
[8] Ji In Kim, Min Ju Kim*, "Performance Adjustable Ultra-Thin Functional Co-Polymer Film Based Memristors for Neural Network Operation" 2024 Wiley Forum Fall, 2024/10/11 (Invited)
[7] Min Ju Kim*, "Functional Organic-Inorganic Hybrid Nano-Polymeric Thin Film for Intelligent Neuromorphic Devices" 2024, Wiley Forum Fall, 2024/10/11 (Invited)
[6] Seung Hyun Oh, Chang Hyeon Lee, Hee Tae Kim, Jeong Ik Park, Min Ju Kim, Se Jun Park, Sung Gap Im, Sung Haeng Cho and Byung Jin Cho*, "Overcoming Performance Limitation of IGZO FET by iCVD Fluorine Doping" 2024 VLSI Syposium, 2024/06/16
[5] M. J. Kim, "Highly Reliable Organic Non-Volatile Memory Devices Based-on Hybrid Films via iCVD Process", 2023 17th ROK-USA Nanotechnology Forum, 2023/04/04 (Invited)
[4] M. J. Kim, "Inorganic-Graded Highly Reliable Organic Non-Volatile Memory Device Using iCVD Process", 2023 Nano Convergence Conference, 2023/01/26 (Invited)
[3] E. J. Shin, S. W. Shin, S. H. Lee, T. I. Lee, M. J. Kim, H. J. Ahn, W. S. Hwang, J. Lee and B. J. Cho*, “Capacitance Boosting by Anti-Ferroelectric Blocking Layer in Charge Trap Flash Memory Device”, 2020 IEDM, Virtual meeting, 2020/12/14 (with SAMSUNG)
[2] M. J. Kim, K. Pak, W. S. Hwang, S. G. Im and B. J. Cho*, “Vapor-Phase Synthesis of Organic-Inorganic Hybrid Gate Dielectric for Flexible Electronics”, 2019 MRS Spring Meeting & Exhibit. Phoenix, Arizona, 2019/4/13
[1] M. J. Kim, J. H. Park, D. S. Jeon, T. H. Lee, T. G. Kim*, “Various Metal-Doped ITO as Transparent Conductive Electrode for Near-Ultraviolet Light Emitting Diodes”, 2015 11th Conference on Laser and Electro-Optics Pacific Rim, Busan, Korea, 2015/08/24.
[20] 김민주, “iCVD를 이용한 기능성 초박막 고분자 소재의 첨단 디스플레이/반도체로의 응용", The 2nd Korean Meeting on Information Display, Gangneung, Korea, Feburary 19-21. (2026) (Invited)
[19] 황남기, 김지인, 박인수, 유지호, 김태훈, 김형준, 김민주, “유기 실록산 초저유전체 소재로 합성한 절연막의 전기적 신뢰성 평가에 대한 연구", The 32th Korean Conference on Semiconductors, Kangwondo, Korea, Feburary 12-14. (2025)
[18] 유지호, 황남기, 박인수, 김태훈, 김형준, 김민주, “이차원 소재 기반 트랜지스터의 고성능 동작을 위한 고유전율/고신뢰성 유전막 개발 및 특성 평가", The 32th Korean Conference on Semiconductors, Kangwondo, Korea, Feburary 12-14. (2025)
[17] 김형준, 김지인, 박인수, 황남기, 김태훈, 유지호, 김민주, “무장벽 3D 멀티칩 적층을 위한 구리/고분자 하이브리드 본딩 플라즈마-프리 공정", The 32th Korean Conference on Semiconductors, Kangwondo, Korea, Feburary 12-14. (2025)
[16] 김태훈, 오정엽, 이현지, 유지호, 김지인, 황남기, 박인수, 김민주, “가변적/ 고집적 iCVD기반의 유무기 혼성 고분자 게이트 스텍 전하 포획형 비휘발성 메모리 시냅스 배열", The 32th Korean Conference on Semiconductors, Kangwondo, Korea, Feburary 12-14. (2025)
[15] 김지인, 박인수, 황남기, 김태훈, 유지호, 김형준, 김민주, “신경망 운영을 위한 성능 조절 가능한 초박형 기능성 공중합 필름 기반 멤리스터", The 32th Korean Conference on Semiconductors, Kangwondo, Korea, Feburary 12-14. (2025)
[14] 박인수, 서다희, 황완식, 김민주, “First Demonstration of Sn Diffusion into Gallium Oxide from Poly-tetraallyl Tin Desposited by iCVD by Thermal Treatment", 전기전자재료학회 추계학술대회, 평창, Korea, October 31-November 1. (2024)
[13] 오승현, 이창현, 조성행, 김희태, 박정익, 김민주, 박영근, 정민규, 박세준, 임성갑, 조병진, “고분자 iCVD 증착 기술을 이용한 불소 도핑에 의한a-InGaZnO 박막 트랜지스터 소자 특성 향상", The 30th Korean Conference on Semiconductors, Gyeongju, Korea, Feburary 24-26. (2024)
[12] Jun Hyup Jin, Ji In Kim, In Su Park, Ji Ho Yu, Nam Ki Hwang, and Min Ju Kim, “유기물 기반 비휘발성 전하 포획형 메모리 두께 증가에 따른 전기적 특성에 관한 연구”, The 31th Korean Conference on Semiconductors, Gyeongju, Korea, Feburary 24-26. (2024)
[11] Ji In Kim, Jun Hyup Jin, In Su Park, Nam Ki Hwang, Ji Ho Yu, Tae Hoon Kim, and Min Ju Kim “Ultra-Thin Hybrid Films-Based Resistive Random-Access Memory Behaviors According to Inorganic Concentration Changes”, The 31th Korean Conference on Semiconductors, Gyeongju, Korea, Feburary 24-26. (2024)
[10] Junhyup Jin, Ji In Kim, In Su Park, Min Ju Kim, “유기물 기반 비휘발성 전하 포획형 메모리의 발전 방향성” The 30th Korean Conference on Semiconductors, Kangwondo, Korea, Feburary 13-15. (2023)
[9] In Su Park, Junhyup Jin, Ji In Kim, Min Ju Kim, “CVD 기반 유-무기 고분자 합성 공정의 반도체 분야로의 적용과 발전 방향” The 30th Korean Conference on Semiconductors, Kangwondo, Korea, Feburary 13-15. (2023)
[8] Ji In Kim, Junhyup Jin, In Su Park, Min Ju Kim, “이종 메커니즘 기반의 Hybrid-ReRAM의 발전 가능성과 방향성” The 30th Korean Conference on Semiconductors, Kangwondo, Korea, Feburary 13-15. (2023)
[7] T. I. Lee, M. C. Nguyen, M. J. Kim, H. J. Ahn, E. J. Shin, S. H. Lee, S. W. Shin, W. S. Hwang, H. Y. Yu, and B. J. Cho, "Superior Carrier Mobility of Ge MOSFETs Depending on Channel Orientation with EOT of 0.57 nm Using Y-ZrO2/GeOx/Ge Stack", The 27th Korean Conference on Semiconductors, Kangwondo, Korea, Feburary 12-14. (2020)
[6] S. W. Shin, E. J. Shin, S. H. Lee, T. I. Lee, M. J. Kim, H. J. Ahn, W. S. Hwang, and B. J. Cho*, "Enhancement of Program window and Operation Efficiency in Charge Trap Memory Using Anti-ferroelectric HfZrO2", The 27th Korean Conference on Semiconductors, Kangwondo, Korea, Feburary 12-14. (2020).
[5] T. I. Lee, M. J. Kim, H. J. Ahn, E. J. Shin, S. H. Lee, S. W. Shin, W. S. Hwang, H. Y. Yu, and B. J. Cho*, “Y 도핑된 ZrO2 고유전율 박막을 이용한 0.67 nm의 EOT와 매우 낮은 누설 전류를 가지는 Ge 기반 게이트 구조”, The 26th Korean Conference on Semiconductors, Kangwondo, Korea, Feb. 13-15, (2019).
[4] M. J. Kim, K. Pak, T. I. Lee, S. G. Im and B. J. Cho, "기상합성 고유전율 하이브리드 절연막", The 26th Korean Conference on Semiconductors, Kangwondo, Korea, Feb. 13-15, (2019).
[3] K. Pak, M. J. Kim, B. J. Cho and S. G. Im, “Novel Vapor-phase Synthesis of Homogeneous Organic-Inorganic Hybrid films and its Application to electronic devices”, The 2018 Korean Conference on Chemical Engineering, Daegu, Oct. 24-26, Korea (2018)
[2] T. I. Lee, M. J. Kim, M. C. Nguyen, H. J. Ahn, J. Moon, T. Y. Lee, H. Y. Yu, R. Choi, W. S. Hwang, and B. J. Cho*, “Ge 기반의 소자에서 Y-ZrO2 게이트 유전체를 이용한 EOT 스케일링(~5.7 A) 및 누설 전류와 계면 트랩의 감소”, The 25th Korean Conference on Semiconductors, Kangwondo, Korea, Feb. 5-7, 2018.
[1] M. J. Kim, K. Pak, T. I. Lee, S. G. Im and B. J. Cho, “기상 증착 기반 유연 전자 소자용 유-무기 절연막”, The 25th Korean Conference on Semiconductors, Kangwondo, Korea, Feb. 5-7 (2018) - oral