(Keynote talk) Innovative Pathways in Semiconductor Processing Using ALD BeO and MacEtch
Oxidant Free MACE of Si Using Ultrathin Ni Catalyst: Smooth Etching and Wafer-Scale
Haekyun Bong, Kyunghwan Kim, Jungwoo Oh
Thermal Conductivity Measurements of BeO Thin Films Grown by Plasma Enhanced Atomic Layer Deposition
Jihyun Kim, Jonghyun Bae, Dongyun Seo, Dohwan Jung, Jungwoo Oh, Jungwan Cho
IEEE ITherm (2025.05) The Intersociety Conference on Thermal and Thermomechanical Phenomena in Electronic Systems
Enhancing BeO Electric Properties on 4H-SiC with SiO₂ Interlayer for Power Device Applications
Sangoh Han, Juyoung chae, Jonghyun Bae, Dohwan Jung, Siwon Lee, Jungwoo Oh
Ultrathin Ni catalyst for CMOS-compatible metal-assisted chemical etching of Si
Kyunghwan Kim, Haekyun Bong, Sunhae Choi, Jungwoo Oh
Electrical Properties of Atomic Layer Deposited Beryllium Oxide on Si
Gyeonghan Nae, Dohwan Jung, Jonghyun Bae, Sangoh Han ,Jungwoo Oh
High etch rate of Metal-assisted chemical etching on Si microstructure with optimized Au thickness and etchant temperature
Sumin Jeon, Haekyun Bong, and Jungwoo Oh
Atomic Layer Deposition of Beryllium Oxide on Germanium for Enhanced Interface Layer
Jeongwoo Lee, Siwon Lee, Sangoh Han, Jonghyun Bae , Jungwoo Oh
Thermal Conductivity Measurements of BeO Thin Films Grown by Plasma Enhanced Atomic Layer Deposition
Jihyun Kim†, Jonghyun Bae†, Dongyun Seo, Dohwan Jung, Jungwoo Oh*, and Jungwan Cho*
APWS 2024 (Asia-Pacific Workshop on Widegap Semiconductors) (2024.10)
Optimization of ALD Beryllium Oxide as a Potential High-K Dielectric for Low-Leakage Ge transistor
Sangoh Han, Dohwan Jung, Jonghyun Bae, Haekyun Bong, Juyoung chae, Christopher W. Bielawski, Jungwoo Oh
Improved Dielectric Properties of Atomic Layer Deposited BeO using the Discrete Feeding Method
Juyoung Chae, Jonghyun Bae, Yoonseo Jang, Jungwoo Oh
베릴륨 산화물 이용한 다결정 저마늄 층의 저온 결정화 연구
봉해균, 장윤서, 배종현, Christopher W. Bielawski, 오정우
대한전자공학회 2024년도 하계종합학술대회 (2024.06)
ALD BeO Gate Dielectric for Improved Thermal Management in β-Ga2O3 Power Devices
정도환, 장윤서, 봉해균, 배종현, 채주영, 한상오, Christopher W. Bielawski, 오정우
ALD BeO Grown on (-201) and (001) β-Ga2O3 Substrates for Power Devices
Dohwan Jung, Yoonseo Jang, Sangoh Han, Christopher W. Bielawski, Jungwoo Oh
Nickel-Silicide Alloy as an Alternative to Noble Metal Catalyst for Metal-assisted Chemical Etching of Si
Haekyun Bong, Kyunghwan Kim, Sunhae Choi, Jungwoo Oh
Demonstration of Atomic Layer Deposition of BeO using Discrete Feeding Method
Jonghyun Bae, Yoonseo Jang, Juyoung Chae, Christopher W. Bielawski, Jungwoo Oh
Optimization of ALD BeO Gate Dielectrics for 3D CMOS Devices
Applications of Atomic Layer Deposition of BeO: From Gate Dielectrics to Ferroelectric Memristors
Sangoh Han, Yoonseo Jang, Dohwan Jung, Haekyun Bong, Jonghyun Bae, Juyoung Chae. Christopher W. Bielawski, Jungwoo Oh
Electrical and Thermal Properties of BeO Gate Dielectrics for β-Ga2O3 Power Devices
Dohwan Jung, Yoonseo Jang, Prakash R. Sultane, Christopher W. Bielawski, Jungwoo Oh
Catalytic Metal-assisted Chemical Etching and Chemical Imprinting of Semiconductors
(Invited talk) Jungwoo Oh
Atomic Layer Deposition of BeO for Wide-Bandgap Semiconductor Heterostructures
(Invited talk) Jungwoo Oh
High conduction band offset of ALD BeO film on Wide-Bandgap Semiconductors
Dohwan Jung, Yoonseo Jang, Prakash R. Sultane, Christopher W. Bielawski, Jungwoo Oh*
Plasma Enhanced Atomic Layer Deposition of Crystalline BeO Films for Wide-Bandgap Semiconductors
Yoonseo Jang, Dohwan Jung, Christopher W. Bielawski, Jungwoo Oh*
High Conduction Band Offset of ALD BeO Films on β-Ga2O3 Substrates
Dohwan Jung, Yoonseo Jang, Prakash R. Sultane, Christopher W. Bielawski, Jungwoo Oh*
Polarization Effects of Wurtzite BeO/ZnO Heterostructures via Atomic Layer Deposition
Yoonseo Jang, Dohwan Jung, Christopher W. Bielawski, Jungwoo Oh*
Crystalline BeO Film Grown by Atomic Layer Deposition for Wide Bandgap Semiconductor Devices
Dohwan Jung, Yoonseo Jang, Prakash R. Sultane, Christopher W.Bielawski, Jungwoo Oh
Direct Patterning of Crystalline Semiconductor by Integration of Nanoimprint lithographyand Metal-assisted Chemical Etching
Kyunghwan Kim, Haekyun Bong, Sunhae Choi, Jungwoo Oh
Ultrahigh-Etch-Rate Metal-Assisted Chemical Etching of Si Microstructures
Sunhae Choi, Kyunghwan Kim, Haekyun Bong, and Jungwoo Oh
AWAD 2022 (Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices) (2022.07)
Front-end-of-line 공정 적용을 위한 플라즈마 강화 원자층 증착법으로 제조된 BeO 박막의 특성
장윤서, 정도환, Prakash R. Sultane, Christopher W. Bielawski, 오정우
전기화학식각법을 이용한 Ge 마이크로 구조 제작
대한전자공학회 하계종합학술대회 (2022.06)
Deep-Etched Si Microstructures via Metal-Assisted Chemical Etching
Sunhae Choi, Kyunghwan Kim, Haekyun Bong, Jungwoo Oh
Terracing α-Mo2C Electrocatalyst for pH-Universal Hydrogen Evolution Reaction
Jangwon Bang, In Kyu Moon, Jungwoo Oh
Low Temperature Growth of Beryllium Oxide Thin Films by Plasma Enhanced Atomic Layer Deposition
Yoonseo Jang, Dohwan Jung, Christopher W. Bielawski, Jungwoo Oh
Low Interfacial Thermal Resistance for BeO-on-Diamond
Kiumars Aryana, Yoonseo Jang, David Olson, John Gaskins, Dohwan Jung, Jung Yum, Eric Larsen, Christopher Bielawski, Sean King, Jungwoo Oh, Patrick Hopkins
MRS Fall Meeting (2020.11)
Multidimensional Single-Crystalline 2D Mo2C sheets for pH-universal Hydrogen Evolution Reaction
Jangwon Bang, In Kyu Moon, Keorock Choi, Jungwoo Oh
Surface Texturing of Conductive Electrodes for Front-illuminated Devices via Metal-assisted Chemical Etching
Haekyun Bong, Kyunghwan Kim, Jungwoo Oh
Properties of beryllium oxide thin films prepared by plasma-enhanced atomic layer deposition
Yoonseo Jang, Seung Min Lee, Jung Hwan Yum, Eric S. Larsen, Christopher W. Bielawski, Jungwoo Oh
Epitaxial BeO Dielectric based AlGaN/GaN metal-oxide semiconductor high-electron-mobility transistors
Dohwan Jung, Seonno Yoon, Jungwoo Oh
Single-step nanopatterning of GaAs via wet-based chemical etching with metal stamp
Kyunghwan Kim, Bugeun Ki, Keorock Choi, Seung Min Lee, Jungwoo Oh
AlGaN/GaN MOS power transistors with epitaxial BeO gate dielectrics
Dohwan Jung, Seonno Yoon, Seung Min Lee, Jung Hwan Yum, Eric S. Larsen, Christopher W. Bielawski, Jungwoo Oh
Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices (AWAD) (2019.07)
Characteristics of BeO thin films grown by plasma-enhanced atomic layer deposition
Yoonseo Jang, Seung Min Lee, Jung Hwan Yum, Eric S. Larsen, Christopher W. Bielawski , Jungwoo Oh
Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices (AWAD) (2019.07)
High quality 2D Mo2C and 2D Mo2C/Graphene heterostructure directly grown by chemical vapor deposition
Jangwon Bang, In Kyu Moon, Jungwoo Oh
Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices (AWAD) (2019.07)
Effect of Pt morphologies on photoelectochemical water splitting on GaAs for hydrogen production
Keorock Choi, In Kyu Moon, Jungwoo Oh
Resist-free Fabrication of Three-dimensional Silicon in a Single Chemical Process
Bugeun Ki, Keorock Choi, Kyunghwan Kim, Jungwoo Oh
Atomic-layer deposition of crystalline BeO for gate dielectrics of wide-bandgap power transistors
Seung Min Lee, Jung Hwan Yum, Eric S. Larsen, Christopher W. Bielawski , Jungwoo Oh
Electronic and physical structures of atomic-layer deposited BeO on beta-Ga2O3
Seung Min Lee, Jongho Jung, Jung Hwan Yum, Jungwoo Oh
Metal catalyzed direct imprinting of GaAs in etch bath
Kyunghwan Kim, Bugeun Ki, Keorock Choi, Seungmin Lee, and Jungwoo Oh
Nano Convergence Conference (2019.01)
Exceptional Crystal and Electrical Properties of Atomic Layer Deposited BeO on 4H-SiC
Seung Min Lee, Jung Hwan Yum, Eric S. Larsen, Christopher W. Bielawski and Jungwoo Oh
IEEE Semiconductor Interface Specialists Conference (SISC), San Diego (2018.12)
Epitaxial ZnO dielectric based AlGaN/GaN metal-oxide semiconductor high-electron-mobility transistor
Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices (AWAD), Japan (2018.07)
Direct imprinting three-dimensional Si patterns using metal catalytic stamp
Bugeun Ki, Keorock Choi, Kyunghwan Kim, Jungwoo Oh
Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices (AWAD), Japan (2018.07)
Epitaxial Growth of BeO-on-GaN using Atomic Layer Deposition
Seung Min Lee, Jung Hwan Yum, Eric S. Larsen, Christopher W. Bielawski , Jungwoo Oh
Domain match mechanism of wurtzite BeO thin films on GaN substrates
Seung Min Lee, Jung Hwan Yum, Eric S. Larsen, Christopher W. Bielawski , Jungwoo Oh
Nano Convergence Conference (2018.01)
Dual textured GaAs by wet chemical etching assisted with metal catalyst
Kyunghwan Kim, Jungwoo Oh
Nano Convergence Conference (2018.01)
Epitaxial Silicon on Beryllium Oxide Atomic Layer Deposited on Silicon Substrate
Seung Min Lee, Jung Hwan Yum, Eric S. Larsen, Woo Chul Lee, Seong Keun Kim, Christopher W. Bielawski, Jungwoo Oh
IEEE Semiconductor Interface Specialists Conference (SISC), San Diego (2017.12)
Surface texturing of GaAs with anisotropic chemical etching and interfacial metal catalysts
Kyunghwan Kim and Jungwoo Oh
IEEE Semiconductor Interface Specialists Conference (SISC), San Diego (2017.12)
The characteristics of changes in etch rate by metal thickness in Si metal-assisted chemical etching (poster)
Keorock Choi and Jungwoo Oh
Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices (AWAD), Korea (2017.07)
Wet-based surface texturing for GaAs antireflective structures (Oral)
Kyunghwan Kim and Jungwoo Oh
Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices (AWAD), Korea (2017.07)
Antireflective Si nanohole subwavelength structures by wet-based chemical etching
Yunwon Song, Kyunghwan Kim and Jungwoo Oh
E-MRS, Warsaw, Poland (2016.09)
Surface reflection of GaAs textures in micro/nano scales fabricated by an-isotropic and metal assisted chemical etching
Kyunghwan Kim, Yunwon Song and Jungwoo Oh
E-MRS, Warsaw, Poland (2016.09)
Optical Characteristics of Ge-on-Si after Phosphorus Implantation for Monolithic Integration on Si Platform
Jiwoong Baek, Bugeun Ki, Chulwon Lee, Yong-Hoon Cho, Donguk Nam, Jungwoo Oh
Photoluminescence Characteristics after Phosphorus Implantation onto In-situ Doped Ge-on-Si for CMOS-compatible Ge lasers
Jiwoong Baek, Bugeun Ki and Jungwoo Oh
Asia-Pacific Workshop on Fundamentals and Applications of Advanced Semiconductor Devices (AWAD) (2016.07)
Highly Compressible and Conductive N-Doped Graphene Foam for Lithium Batteries
I. K. Moon, K. Y. Chun, and J. Oh
18th International Meeting on Lithium Batteries (2016.06)
3D reduced graphene oxide aerogels with high electrical conductivity
In Kyu Moon, Seonno Yoon Kyung Hwan Kim and Jungwoo Oh
Korean Conference on Semiconductors (KCS), Korea (2016.02)
Hot Carrier Degradation of Ni related Defects in Sub-100nm Ni-Pt Salicide FinFETs
Seung Min Lee and Jungwoo Oh
Korean Conference on Semiconductors (KCS), Korea (2016.02)
Alternative Etching Technique of Metal-Assisted Chemical Etching for High Aspect Ratio 3D-Device Fabrication
Keorock Choi and Jungwoo Oh
Korean Conference on Semiconductors (KCS), Korea (2016.02)
Antireflective Subwavelength Structures fabricated by Au-assisted agglomeration and chemical etching on GaAs
Yunwon Song and Jungwoo Oh
EUPVSEC, Hamburg, Germany (2015.09)
Raman Analysis of in-plane Biaxial Strain for Ge-on-Si Lasers
Bugeun Ki, Jiwoong Baek, Chulwon Lee, Yong-Hoon Cho, and Jungwoo Oh
CLEO-PR, Busan, Korea (2015.08)
Interfacial reactions of Si/Ti/Al/Cu Ohmic metallization on AlGaN/GaN heterostructures
Seonno Yoon, Jangwon Bang, Yunwon Song and Jungwoo Oh
KCS, Incheon, Korea (2015.02)
Antireflective Subwavelength Structures for High Efficient III-V Photovoltaics
Yunwon Song and Jungwoo Oh
KCS, Incheon, Korea (2015.02)
Raman depth profiles for non-linearly strained Ge-on-Si Laser
Bugeun Ki, Chulwon Lee, Yong-Hun Cho, and Jungwoo Oh
KCS, Incheon, Korea (2015.02)
Three-dimensional Si nano- and micro-structures using metal-assisted chemical etching
Keorock Choi and Jungwoo Oh
KCS, Incheon, Korea (2015.02)
Metal Assisted Chemical etch of Si for Three-Dimensional Information and Energy Devices
Keorock Choi, Yunwon Song and Jungwoo Oh
ENGE, Jeju, Korea (2014.11)
Structural characterization of Ohmic contact using Cu outer layer for AlGaN/GaN High Electron Mobility Transistors
Seonno Yoon, Jangwon Bang and Jungwoo Oh
ENGE, Jeju, Korea (2014.11)
The Effects of Metal Thickness and Pattern Size on Micro-Scale Metal-Assisted Chemical Etching of Silicon
Keorock Choi, Yunwon Song and Jungwoo Oh
ECS, Cancun, Mexico (2014.10)
Antirefletive characteristics of disordered GaAs subwavelength structures realized by metal-assisted chemical etching using thermally dewetted Au catalytic nanoparticles
Yunwon Song, Keorock Choi and Jungwoo Oh
ECS, Cancun, Mexico (2014.10)
Physical Analysis of Alternative Cu-based Ohmic Contact to Au free CMOS Compatible AlGaN/GaN High Electron Mobility Transistors
Seonno Yoon, Jangwon Bang, Yungwon Song and Jungwoo Oh
IWN, Wroclaw, Poland (2014.08)
Control of tensile strain epitaxial Ge film on Si (001) substrate by e-beam evaporator
Kyungho Kim, Bugeun Ki and Jungwoo Oh
AWAD, Kanazawa, Japan (2014.07)
Raman analysis of thermally induced tensile strain of Ge-on-Si epitaxy for Si-compatible direct bandgap Ge lasers
Bugeun Ki, Kyungho Kim and Jungwoo Oh
MRS, San Francisco, USA (2014.04)
AlGaN/GaN Metal-Oxide-Semiconductor High Electron Mobility Transistors with Al2O3 and HfO2 High-k gate dielectric deposited on n+ GaN Cap Layers
Seonno Yoon and Jungwoo Oh
MRS, San Francisco, USA (2014.04)
Gate controlled spin-orbit coupling in the InAs quantum well structure
High Aspect Ratio 3차원 화합물반도체 구조 제작을 위한 비등방성 화학일차원 식각기술 조건 연구
Non-Si high mobility Ge/III-V CMOS challenges and opportunities
ISPSA, Jeju, Korea (2013.07)
Alternative Channel III-V/Ge on Si Transistors for POST CMOS Architecture
Jungwoo Oh, Yunwon Song, Seonno Yoon and Bugeun Ki
Comparative Study of Gate First and Last Si MOSFETs Fabrication Processes Using ALD Beryllium Oxide as an Interface Passivation Layer
J. H. Yum, H. S. Shin, Ryan M. Mushinski, Todd. W. Hudnall, Jungwoo Oh, W. Y. Loh, C. W. Bielawski, G. Bersuker, S. K. Banerjee, W. E. Wang, P.D. Kirsch, and R. Jammy
International Symposium on VLSI-TSA, Hsinchu Taiwan (2013)
High Mobility III-V Channel CMOS Technologies and Extension to Heterogeneous Optoelectronic Device Integration
InAs Quantum-Well MOSFET (Lg = 100 nm) with Record High gm, fT and fmax
T.-W. Kim, R. Hill, C.D. Young, D. Veksler, L. Morassi, S. Oktybrshky, Jungwoo Oh, C.Y. Kang, D.-H. Kim, J.A. Del Alamo, C. Hobbs, P. Kirsch, R. Jammy
Proc. Symposium on VLSI Technology (2012. 06)
“CMOS-compatible III-V field-effect transistor development for high performance and low power”, Jungwoo Oh, J et.al, Asia-Pacific Workshop on Fundamentals and Applications of. Advanced Semiconductor Devices (AWAD), Daejeon, Korea, June 2011 Invited
“Gate Dielectric Issues on InGaAs High Mobility Channel Materials”, Jungwoo Oh, J et.al, MRS April 2011 Invited
“CMOS Scaling With III-V Channels For Improved Performance And Low Power”, R. J. W. Hill, J. Oh, C. Park, J. Barnett, J. Price, J. Huang, N. Goel, W.Y. Loh, P. Kirsch, P. Majhi, R. Jammy, ECS May 2011
“High-performance Enhancement-Mode In0.53Ga0.47As surface channels n-MOSFET with thin In0.2Ga0.8As capping and laser anneal effect,”, Ok, I.;Hung, P. Y. ; Veksler, D. ; Oh, J. ; Majhi, P. ; Jammy, R., Solid-State Device Research Conference (ESSDERC), 2010 Proceedings of the European, pp. 166 – 169, Sevilla, Spain. Sept. 2010
“High Specific Contact Resistance of Ohmic Contacts to n-Ge Source/Drain and Low Transport Characteristics of Ge nMOSFETs”, J. Oh, J. Huang,Y. T. Chen, I. Ok,K. Jeon,S. H. Lee,B. Sassman,W. Y. Loh,H. D. Lee,D. H. Ko,P. D. Kirsch,R. Jammy, International Conference on Solid State Devices and Materials (SSDM), Tokyo Japan, 2010
“SiGe CMOS on (110) Channel Orientation with Mobility Boosters: Surface Orientation, Channel Directions, and Uniaxial Strain”, J.Oh, S.-H. Lee, K.-S. Min, J. Huang, B.G. Min, B. Sassman, K. Jeon, W.-Y. Loh, J. Barnett, I. Ok, C.-Y. Kang, C. Smith, D.-H. Ko, P. D. Kirsch, and R. Jammy, Symposia on VLSI Technology, Hawaii, 2010
"High Transport Si/SiGe Heterostructures for CMOS Transistors with Orientation and Strain Enhanced Mobility,”, Jungwoo Oh, J et.al. Asia-Pacific Workshop on Fundamentals and Applications of. Advanced Semiconductor Devices (AWAD), Tokyo Japan, June 2010 Invited
“Enhanced Performance in SOI FinFETs with Low Series Resistance by Aluminum Implant as a Solution Beyond 22nm Node,”, I. Ok, C. D. Young, W. Y. Loh, T. Ngai, S Lian, J. Oh, M. P. Rodgers1, S. Bennett, H. O. Stamper, D. L. Franca1, S. Lin, K. Akarvardar, C. Smith, C. Hobbs, P. Kirsch, R. Jammy, Symposia on VLSI Technology, 2010
“Si Tunnel Transistors with a Novel Silicided Source and 46 mV/dec Swing,”, K. Jeon, Wei-Yip Loh, Pratik Patel, Chang Yong Kang, Jungwoo Oh, Anupama Bowonder, Chanro Park, C. S. Park, Casey Smith, Prashant Majhi, Hsing-Huang Tseng, Raj Jammy, Tsu-Jae King Liu, and Chenming Hu, Symposia on VLSI Technology, Hawaii, 2010
“Mechanisms for Low On-State Current of Ge (SiGe) nMOSFETs: A Comparative Study on Gate Stack, Resistance, and Orientation-Dependent Effective Masses", J. Oh, I. Ok, C.-Y. Kang, M. Jamil, S.-H. Lee1, W.-Y. Loh, J. Huang, B. Sassman, L. Smith, S. Parthasarathy, B. E. Coss, W.-H. Choi, H.-D. Lee, M. Cho, S. K. Banerjee, P. Majhi, P. D. Kirsch, H.-H. Tseng and R. Jammy, Symposia on VLSI Technology, Kyoto Japan 2009
“Additive Mobility Enhancement and Off-State Current Reduction in SiGe Channel pMOSFETs with Optimized Si Cap and High-k Metal Gate Stacks”, Jungwoo Oh, Prashant Majhi, and Raj Jammy, Raymond Joe, Anthony Dip, Takuya Sugawara, Yasushi Akasaka, Takanou Kaitsuka, Tsunetoshi Arikado, and Masayuki Tomoyasu, International Symposium on VLSI-TSA, Hsinchu Taiwan, 2009
“High Mobility and Advanced Channels Materials”, Jungwoo Oh, Prashant Majhi, and Raj Jammy, IEEE International Conference on Advanced Thermal Processing of Semiconductors, Sep. Las Vegas, 2008.
“High Mobility SiGe Channel pMOSFETs Epitaxially Grown on Si (100) Substrates with HfSiO2 High-k Dielectric and Metal Gate”, Jungwoo Oh, Prashant Majhi, Chang Yong Kang, and Raj Jammy, International Conference on Solid State Devices and Materials (SSDM), Tsukuba Japan, 2008.
“Controlled threshold voltage of high-mobility Ge pMOSFETs with high-k/metal gate on epitaxial Ge films on Si substrates”, Jungwoo Oh, Prashant Majhi, Hideok Lee, Ooksang Yoo, Sehoon Lee, Sanjay Banerjee, Hsing-Huang Tseng, and Raj Jammy, International Symposium on VLSI-TSA, Hsinchu Taiwan, 2008.
"Formation of shallow junctions using Ge-Si heterostructures for high-mobility channel MOSFETs", Jungwoo Oh et.al., International Workshop on Junction Technology (IWJT), Kyoto, Japan, 2007.
“Combined Effects of an Epitaxial Ge Channel and Si Substrate on Ge-on-Si MOS Capacitors and Field Effect Transistors”, Jungwoo Oh, Prashant Majhi, Hideok Lee, Sehoon Lee, Sanjay Banerjee, Pankaj Kalra, Rusty Harris, Hsing-Huang Tseng, and Raj Jammy, International Conference on Solid State Devices and Materials (SSDM), Tsukuba Japan, 2007. Invited
"Formation of shallow junctions using Ge-Si heterostructures for high-mobility channel MOSFETs", Jungwoo Oh, P. Majhi, H.-D. Lee, K.-T. Lee, W.-H. Choi, J.-W. Yang, C.-Y. Kang, H.R. Harris, S.C.Song, P. Kalra, S.H.Lee, S. Banerjee, B. H. Lee, H.-H. Tseng, and R. Jammy, International Workshop on Junction Technology (IWJT), Kyoto, Japan, 2007. Invited
“Band-Engineered Low PMOS VT with High-K/Metal Gate Including High Performance Dual Channel CMOS Integration”, H. Rusty Harris, Pankaj Kalra, Prashant Majhi, Muhammed Hussain, David Kelly, Jungwoo Oh, Dawei He, Casey Smith, Joel Barnett, Paul D. Kirsch, Gabriel Gebara, Jess Jur, Daniel Lichtenwalner, Abigail Lubow, T.P. Ma, Guangyu Sung, Scott Thompson, Byoung Hun Lee, Hsing-Huang Tseng and Raj Jammy, VLSI Tech., 2007.
“Characterization of Ultra Shallow S/D Junctions in Ge pMOSFETs”, Hi-Deok Lee, Kyong-Taek Lee, Jungwoo Oh, In-Shik Han, J.-W. Yang, C.Y. Kang, H.R. Harris, P. Kalra, P. Majhi, S.C. Song, R. Choi, B.H. Lee, Yoon-Ha Jeong, H-H. Tseng, and R. Jammy, Silicon Nanoelectronics Workshop (SNW), Kyoto, Japan, 2007
"Effect of Si cap layer on interface quality and NBTI in Ge-on-Si with HfSiO for High Mobility Channel pMOSFETs", Ooksang Yoo, Jungwoo oh, Kyung Seok Min, Chang Yong Kang, Kyong-Taek Leeb,MinKi Na, S.C. Song, R. Choi, B. H. Lee, P. Majhi, H-H Tseng and Hi-Deok Lee, ISAGST 2007
“Fabrication of Ge MOS Capacitors on Si Substrates using Selective Ge Epitaxy and Surface Passivation Techniques”, Jungwoo Oh, et al, IEEE Semiconductor Interface Specialists Conference (SISC), CA 2006.
“Ge on Si Photodiodes for Si CMOS Monolithic Optical Receivers”, Joe C. Campbell, Zhihong Huang, and Jungwoo Oh (presenter), Electrochemical Society (ECS), 2006. Invited
"Effectiveness of SiGe Buffer Layers in Reducing Dark Current in Ge-on-Si Photodetectors”, Zhihong Huang; Ning Kong; Jungwoo Oh; Sanjay K. Banerjee, and Joe C. Campbell, TMS ELECTRONIC MATERIALS CONFERENCE, 2006
"Single Metal Gate with Dual Work Functions for FD-SOI and UTB Double Gate Technologies", Daniel Pham, Hongfa Luan, Kaveri Mathur, Barry Sassman, Billy Nguyen, George Brown, Ji-woon Yang, Jungwoo Oh, Peter Zeitzoff, Larry Larson, IEEE International SOI Conference , October, 2006
"Metal-germanium-metal photodetectors on heteroepitaxial Ge-on-Si with amorphous Ge Schottky barrier enhancement layers", Jungwoo Oh and J. C. Campbell, IEEE LEOS, ThJ4, 2003.
"Gigahertz photodetectors fabricated in heteroepitaxial Ge-on-Si for use in integrated receivers", R. Jones, S. Thomas, S. Bharatan, R.Thoma, C. Jasper, T. Zirkle, G. Edwards, R. Liu, X. Wang, Q. Xie, C. Rosenblad, J. Ramm, G. Isella, H.von Kanel, Jungwoo Oh, Joe Campbell, American Physical Society, March Meeting, 2003.
“Electrical activation of boron and phosphorus implanted single crystal germanium substrates”, C. Jasper, L. Rubin, C. Lindfors, Kevin Jones, and Jungwoo Oh, Ion Implantation Technology, IIT, 2002.
"Fabrication and Modeling of Gigahertz Photodetectors in Heteroepitaxial Ge-on-Si Using a Graded Buffer Layer Deposited by Low Energy Plasma Enhanced CVD", R.E. Jones, S.G. Thomas, S. Bharatan, R. Thoma, C. Jasper, T. Zirkle, N.V. Edwards, R. Liu, X.D. Wang, Q. Xie, C. Rosenblad, J. Ramm, G. Isella, H. von Kanel, Jungwoo Oh, and J.C.Campbell, IEDM Tech. Dig.,pp. 793-796,2002.