Research Facilities

AC Susceptometer

AC Susceptometer measurement is a non-destructive method used to study the critical current, inter-grain, and intra-grain of the high-temperature superconductors. A sample is subject to a small alternating magnetic field produced by the primary coil. Then, the resulting voltage or emf induced in a secondary coil surrounding the sample was detected and analyzed.

Model: CryoBIND (Cryogenic Balanced Inductive Detector) SR830 lock-in-amplifier

DC/ RF Sputtering System

Sputter deposition is one of the physical vapor deposition (PVD) methods of thin film fabrication designed to deposit uniform conductive and non-conductive materials by direct current (DC) or radio frequency (RF) mode. This system can achieve maximum base pressure and capman pressure at 1 x 10-5 mbar and 100 mTorr respectively.

Model: Kurt J. Lesker PVD 75

Vibrating Sample Magnetometer

Our VSM characterises the magnetization of the sample at room temperature. The system consists of an electromagnet (DC) which provides the magnetic field and a vibrator mechanism to move the sample sinusoidal along z-axis. The detection coils will sense the voltage signal generated from the change in flux by the vibrating sample.

Model: LakeShore 7407 series VSM

Four-Point Probe

Four-point probe is used to measure the sample-dependent temperature resistance. For the four-point probe method, four copper wires shall be attached to the surface of the pellet. Conductive silver paint is used to make contact between the sample and the wire. Using Ohm's law, V = IR, where V = voltage, and I = current, resistance, R, the sample can be calculated. Then, the data will be collected by the Leois Delta Mode program, and the data is shown as a plot of resistance (Ω) versus temperature (K).

Model: Closed-cycle helium cryostat model Ref. 1644CCS, Keithley DC and AC Current Source (Model 6221), Keithley Nanovoltmeter (Model 2182A), Lake Shore Temperature Controller (Model 331), CTI-Cryogenics Compressor (Model 8200), Pfeiffer D- 35614 Asslar Vacuum (Model ONF 25)

Pulsed Laser Deposition

This custom-made system deposits thin film when a pulsed laser beam generated by Nd-YAG laser is focused on a target. The material is vaporized from the target in a plasma plume and deposit onto a substrate. Whole process is carried out in a high vacuum chamber and in the presence of a background gas such as oxygen or argon gas.

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