2차원 TMDc 전용 합성장비 (PECVD) & 식각 장비 (RIE)
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[6-in. ICP-PECVD]
Model: AFS-IC6T
Company: Allforsystem
ICP-Plasma Enhanced Chemical Vapor Deposition (PECVD)
Source: H2S, H2, CF4, SiH4
[Link]
[6-in. RIE]
Model: RAINBOW 4420
Company: Lam Research
Reactive Ion Etcher (RIE)
Dual ICP type
Gas: O2, CF4, Ar, NF3
Insulator (PECVD) & Metal (Sputter) 증착 장비들
[6-in. PECVD]
Model: AMAT-P-5000 (PRECISION 5000)
Company: APPLIED MATERIALS
CCP-PECVD
Source: TEOS
Cluster-4 chamber (2-PECVD, 1-SPUTTER)
[LINK]
[4-in. SPUTTER]
Model: 24EIS06
Company: 이아이 Technology
RF & DC Magnetron Sputtering System (1 DC, 2 RF)
온도컨트롤러: NOVA500
Gas: N2, O2, Ar
그 외 Plasma 장비 (CCP, RPS) 및 유틸리티들 (칠러, 스크러버, 캐비넷)
[6-in. TEST chamber]
Lab manufacture-6"
I-V probe
Langmuir probe
Cut-off probe
[RPS]
Lab manufacture-6 inch
RPS: Remote plasma source
[Chiller]
Company: 이아이(EI)
30 L/min, 20 L
PECVD용
Sputter용
[H2, SiH4, H2 Gas Cabinet]
Model: EGS-S-01
Company: EG solution
For ICP-PECVD
[Dry Gas Scrubber]
Model: CD540S
Company: EG solution
For ICP-PECVD
Plasma 공정 실시간 진단 장비들 (QMS, ToF-MS, OES)
반도체 물성 측정 장비들 (Ellipsometer, AFM, OM, Contact angle)
[Ellipsometer]
Model: M-2000 (w/ auto-alignment)
Company: J.A. Woollam
Range: 1-3.5 eV
Up to 12-inch auto-mapping
[LINK]
[AFM]
Model: NX10
Company: Park Systems
50 um X-Y Scanner
CCD (1.2 M Pixel)
Module option:
KPFM
Variable Enhanced Conductive AFM (VECA)
Ultra low-noise conductive AFM (ULCA)
Plasma 전기적 특성 측정 장비들 (Oscilloscope, Langmuir Probe, Network Analyzer)
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