Secure the sample to a pin stub.
Note the dimensions and geometry.
Log in to NEMO.
Vent the chamber.
Load the sample.
Add the sample dimensions and location.
Pump the chamber.
Center the stub.
Select e-beam voltage and imaging mode.
Wait for the e-beam vacuum indicator to turn green, then turn on the e-beam.
Navigate to a feature.
Zoom and focus.
Set WD + Z to 20mm and focus.
Repeat for WD + Z = 10mm and 6mm
Go to high resolution mode.
At a relativley high magnification, align the aperture and stigmators.
Wait for the i-beam vacuum indicator to turn green, then turn on the i-beam.
In the e-beam window:
Navigate to a feature visible around 100um FOV
Ensure WD + Z = 6mm when in focus
Tilt the stage to 55°
Center and focus the same feature
Set WD + Z to 6mm if it changed.
Set the i-beam voltage and current.
Select the FIB-SEM intersection wizard and follow the steps.
Add a layer then draw a shape and define its dimensions.
Change the current so the process time is between 10 seconds and 5 minutes.
Check that the ion probe current is close to the chosen target.
Change the condenser voltage to achieve a more precise probe current.
Remember to reduce the current when imaging with the i-beam.
Click the play button to start patterning.
Make annotations from the measurement tab and save images.
Turn off both the e-beam and i-beam.
Set the stage tilt to 0°
Vent the system
Click the stage diagram to lower it.
Click the stub location to rotate the stage for easy removal.
Pump the system back to vacuum.
Log out of NEMO
Clean up after yourself.
Click with the mouse wheel to center a feature.
Double left click to reduce the area.
Right click and drag to change the reduced area size.
Scroll to change the scan speed.