RTP Asher Etcher RIE ICP DRIE Sputter Evaporator PECVD ALD SEM Probe Metrology Tester Equipment, 200 300mm Wafers, Wafer Carriers, In U.S.A.
Original Equipment Manufacturer: Oxford
Condition: Used. We sell it at refurbished condition with OEM specifications.
Configuration: TBD. Photo here is only for your reference.
Valid Time: Subject to prior sale. This is only for end users.
Lead Time: TBD
Quantity: 2 sets
Warranty: TBD
Installation and training: Available at extra charge
Service Contract: Available at extra charge
Equipment description below for your reference.
Location: Nanjing, Jiangsu, China
OXFORD Plasmalab 133 RIE (CL)
Model Year : 2003
Quantity : 1
Condition : Refurbished with OEM specifications ,crating, warranty, installation if necessary at different prices.
Serial No : 417718
Availability : Subject to prior sale without notice.
Configuration:
Supports wafer sizes up to 300mm (330mm Platen)
RIE set up for GaN Etch
RF Power: 600W, 13.56MHz
Water cooled electrode 10C-80C
Load Lock with turbo pump
End point detection: Verity Optical emission spectroscopy (200-800nm)
Gas pod with 6 lines including following MFCs:
Ar – 100sccm
CL – 100sccm
BCL3 – 100sccm
N2O – 100sccm
Windows PC, User friendly interface
This tool was removed from production October 2014.
Chiller, Pump are not included.
Location: Nanjing, Jiangsu, China
OXFORD Plasmalab 133 RIE (CL)
Model Year : 2004
Quantity : 1
Condition : Was refurbished with OEM specifications ,crated, 3 month warranty, installation .
Serial No : 417728
Availability :Subject to prior sale without notice.
Configuration:
Supports wafer sizes up to 300mm (330mm Platen)
Mechanical chuck
RIE set up for GaN Etch
RF Power: 600W, 13.56MHz
Water cooled electrode 10C-80C
End point detection: Verity Optical emission spectroscopy (200-800nm)
Gas pod with 8 lines including following 7 MFCs:
Ar – 100sccm
CL2 – 100sccm
BCL3 – 100sccm
N2O – 200sccm
CHF3 – 200sccm
NH3 -100sccm
CH4 – 50sccm
Windows PC, user friendly interface GUI
This tool was removed from production October 2014.