Invited talks
Invited talks
學術演講
(2025.09.01) 國研院國儀中心: ALD Gate Dielectric for Future CMOS Scaling
(2026.08.25) 國研院同步輻射中心: HAXPES, XAS, GIWAXS and XRR for Amorphous Oxide Semiconductor: From Nanostructures to Transport Properties
(2026.09.08) TECIF (TSRI-imec) @比利時: Continuous CMOS Scaling and On-Chip 3D Cache: 2D Materials and Oxide Semiconductors
(2026.10.23) IEDMS invited talk @台北: Enabling Angstrom-Era CMOS Scaling with Two-Dimensional Nanosheet Transistors
書報討論
(2024.11.16) 陽明交大國半院: Future of Nanoelectronics Driven by Talents in Taiwan
(2025.11.14) 清大電子所: ALD Gate Dielectric for Future CMOS Scaling
(2026.05.08) 東華電機資工所: Opportunities in Taiwan for Future of Nanoelectronics
(2026.10.14) 清大工科系所: ALD Gate Dielectric for Future CMOS Scaling
(2026.10.29) 成大電機系所
(2026.11.16) 清大奈微所
其他演講
(2025.08.19) 2025陽明交大圖書館新生活動-研究攻略營系列: 打造你的「護國神山」: 半導體教會我的那些事
(2026.10.14) 2026國立臺灣師範大學英語學術素養中心講座: 打造你的護國神山：從研究室走向世界