Conferences
Conferences
(Oral) T. Lee, B. Chao, Y. Chung, Y. Su, B. Liu, C. Su, C. Kei, C. Cheng, Pinyen Lin, I. Radu, “Development of ALD Gate Dielectrics for TMD Nanosheet FETs,” ALD/ALE 2024, Aug. 4-7, 2024, Helsinki, Finland.
(Invited) S. Takagi, K. Toprasertpong, K. Tahara, E. Nakoh, R. Nakane, Z. Wang, X. Luo, T. E. Lee, and M. Takenaka, “HfZro-Based Ferroelectric Devices for Lower Power AI and Memory Applications,” 240th ECS Meeting, October 10-14, 2021
(Oral) T.-E. Lee, S.-T. Huang, C.-Y. Yang, K. Toprasertpong, M. Takenaka, Y.-J. Lee, and S. Takagi, “Improvement of performance of Si0.8Ge0.2/SOI p-FinFETs by ultrathin Y2O3 gate stacks with TMA treatment,” 2021 International Conference on Solid State Devices and Materials (SSDM2021), Virtual conference, September 6-9, 2021.
(Oral) T.-E. Lee, M. Ke, K. Toprasertpong, M. Takenaka, and S. Takagi, “Characterization of slow traps properties in SiGe MOS interfaces by TiN/Y2O3 gate stacks,” 2021 IEEE International Reliability Physics Symposium (IRPS), Virtual conference, March 21-25, 2021
(Oral) T.-E. Lee, Z. -Y. Lin, K. Toprasertpong, M. Takenaka, and S. Takagi, “Revision of conductance method for evaluating interface state density at MFIS interfaces,” 51st IEEE Semiconductor Interface Specialists Conference (SISC), Virtual conference, December 16-19, 2020
(Plenary) S. Takagi, T.-E. Lee, M. Ke, S.-H. Yoon, D.-H. Ahn, K. Kato, K. Toprasertpong, M. Takenaka, “Importance of Semiconductor MOS Interface Control on Advanced Electron Devices,” International Workshop on "Dielectric Thin Films for Future Electron Devices: Science and Technology" (IWDTF2019) , Tokyo Institute of Technology, Tokyo, Japan, November 18-20, 2019
(Oral) T.-E. Lee, K. Toprasertpong, M. Takenaka, and S. Takagi, “Impact of atomic layer deposition high-k materials on Si0.78Ge0.22 MOS interface properties with TiN gate,” 50th IEEE Semiconductor Interface Specialists Conference (SISC), Bahia Resort Hotel, San Diego, CA, December11-14, 2019
(Oral) Qiang Li, Jae-Hoon Han, Tsung-En Lee, Shinichi Takagi, and Mitsuru Takenaka, “Equivalent oxide thickness scaling for efficient III-V/Si hybrid MOS optical phase shifter,” Compound Semiconductor Week (CSW 2019), Kasugano International Forum, Nara, Japan, May 19-23, 2019
(Invited) S. Takagi, M. Ke, D.-H Ahn, T.-E. Lee, S.-H. Yoon, K. Kato, and M. Takenaka, “MOS interface defect control in alternative channel materials,” Insulating Films on Semiconductors (INFOS 2019), Clare College, Cambridge University, Cambridge, UK, June 30-July 3, 2019
(Oral) T.-E. Lee, K.Kato, M. Takenaka and S. Takagi, “Impact of metal gate electrodes on electrical properties of Y2O3/Si0.78Ge0.22 gate stacks,” Insulating Films on Semiconductors (INFOS 2019), Clare College, Cambridge University, Cambridge, UK, June 30-July 3, 2019
(Oral) T.-E. Lee, M. Ke, K.Kato, M. Takenaka and S. Takagi, “Reduction in interface trap density of TiN/Y2O3/Si0.62Ge0.38 gate stacks with high temperature PMA,” 49th IEEE Semiconductor Interface Specialists Conference (SISC), Catamaran Resort Hotel, San Diego, CA, December 6-8, 2018