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Recent Facility Updates
Recent Facility Updates
Heidelberg Instrument's DWL66+ Direct Write (or maskless) lithography tool is the MSL's newest piece of equipment (installed March 2025).
The tool is good for non-standard substrates, rapid iteration of designs, mask creation, and feature sizes down to 300 nm. It also has grayscale/raster capabilities.
Please see the presentation linked above for more.
As part of a long-awaited infrastructure modernization project in support of Berkeley Lab's Micro Systems Lab (MSL), a new chiller system was delivered and installed on the top of Berkeley Lab's Building 70A on November 23. The new chiller system replaced an older system (with over 25 years in service) to extend this critical facility's useful life.
Excerpt and photos taken from the 5 December 2024 Physics Division article "Chiller system overhaul preps Berkeley Lab's Micro Systems Lab for the next decade"
The new chiller system, fully installed on top of Building 70A, November 2024. Photo: Courtesy of the PIM Division.
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