Current Group Members
Xinglu Wang
B.S. Electronic Science and Technology, Hebei University of Technology (2015)
M.S. Electronic Science and Technology, Nankai University (2018)
Ph.D. Materials Science & Engineering, University of Texas at Dallas, Present
Xinglu Wang joined the Wallace group in August 2018 as a Graduate Research Assistant. His current research is focused on in-situ surface and interface characterization of contacts to 2D semiconductor materials such as Transition Metal Dichalcogenides by X-ray Photoelectron Spectroscopy and Atomic Force Microscopy, as well as various electrical measurement techniques. He is also experienced in thin film growth and high-κ dielectric deposition by Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition.
Further information:
Seong Yeoul Kim
B.S. Advanced Materials Engineering, Kookmin University 2015
M.S. Advanced Materials Engineering, Kookmin University 2017
Ph.D. Materials Science and Engineering, University of Texas at Dallas, Present
Seong Yeoul Kim started in the Wallace Group in August of 2019 as a Graduate Research Assistant and has conducted research in the area of in-situ characterization of ferroelectric HfZrO interfaces with metals and semiconductors, as well as contact interfaces with 2D Transition Metal Dichalcogenides. He is also experienced in thin film growth by Physical Vapor Deposition, Atomic Layer Deposition and Plasma-Enhanced Atomic Layer Deposition
Further information:
https://www.researchgate.net/profile/Seong-Yeoul-Kim