Graduate Students
Graduate Students
Name: Yeseul Son
E-mail: sondotmf@unist.ac.kr
Research Interests:
Atomic layer deposition of precious metals for advanced BEOL (Back-End-of-Line) technologies.
Academic Credential
- B.S. : Materials Science and Engineering (2022)
- MS/PhD : Graduate school of Semiconductor Materials and Devices Engineering (2023.02~)
Name: Minjeong Kweon
E-mail: minj815@unist.ac.kr
Research Interests:
Atomic layer deposition of transition metal-carbides thin films as diffusion barrier for Ru & Cu metallization.
Academic Credential
-B.S. : Materials Science and Engineering (2022)
-MS/PhD : Graduate school of Semiconductor Materials and Devices Engineering (2023.02~)
Name: Chaehyun Park
E-mail: hunnp0908@unist.ac.kr
Research Interests:
Plasma-Enhanced Atomic Layer Deposition (PEALD) of Nb-based thin films for advanced applications in microelectronic devices.
Academic Credential
-B.S. : Materials Science and Engineering (2023)
-M.S/Ph.D : Graduate school of Semiconductor Materials and Devices Engineering (2023.02~)
Name: Jeongha Kim
E-mail: jeongha0508@unist.ac.kr
Research Interests:
Atomic Layer Deposition (ALD) of Ruthenium for Replacing Copper Interconnects
Academic Credential
-B.S. : Chemical Engineering (2023)
-M.S : Graduate school of Semiconductor Materials and Devices Engineering (2023.08~)
Achievements
- Oral Presentation, AVS 24th International Conference on Atomic Layer Deposition (ALD 2024)
- Patent, Method for forming Ru thin film, Japanese Patent application number: 2024-127601, Filing Date: 2nd August, 2024
- Oral Presentation, The Korea Institute of Electrical and Electronic Material Engineers (2024)
Name: Minwoo Kim
E-mail: kminu0424@unist.ac.kr
Research Interests:
Area-selective atomic layer deposition for BEOL (Back-End-of-Line)
Academic Credential
-B.S. : Materials Science and Chemical Engineering (2024)
-MS/PhD : Graduate school of Semiconductor Materials and Devices Engineering (2024.02~)
Name: Yejun Kim
E-mail: kimyj9668@unist.ac.kr
Research Interests: Atomic Layer Deposition (ALD) of Indium Nitride (InN) thin film as diffusion barrier for Cu or Ru metallization.
Academic Credential
-B.S. : Electronic Materials Engineering (2024)
-MS/PhD : Graduate school of Semiconductor Materials and Devices Engineering (2024.02~)
Name: Yewon Seo
E-mail: yee1435@unist.ac.kr
Research Interests:
Academic Credential
-B.S. : Electronic Materials Engineering (2024)
-MS/PhD : Graduate school of Semiconductor Materials and Devices Engineering (2024.02~)
Name: Dongbeom Seo
E-mail: tjehdqja113@unist.ac.kr
Research Interests: Atomic Layer Deposition (ALD) of tungsten-based thin films for diffusion barriers
Academic Credential
-B.S. : Materials Science and Engineering (2024)
-M.S : Graduate school of Semiconductor Materials and Devices Engineering (2024.02~)