Alumni
Alumni
Currently at SK hynix
Currently at Hyundai Elevator
Currently at On Semiconductor
Currently at Applied Materials
Currently at Samsung Electronics
Currently at Samsung Electronics
Currently at Samsung Electronics
Currently at Samsung Electronics
Currently at Samsung Electronics
Currently at Samsung Electronics
Currently at Samsung Electronics
Currently at Samsung Electronics
Research Interests : Stretchable sensor for high-performance E-skin applications
Email: biglight0308@naver.com
Ph.D. student at University of Purdue at Sep. 2023
Currently at SK hynix
Research Interests :
Email:
Currently at Samsung Electronics
Research Interests :
Email:
Currently at Applied Materials
Research Interests : Phase FET
Email: amy897@naver.com
Currently at Samsung Electronics
Research Interests : Phase FET
Email: tkddn7497@naver.com
Currently at Samsung Electronics
Research Interests : FBFET
Email: jhl9311@naver.com
Currently at Synopsys
Research Interests : Machine Learning
Email: jcpukpyi@naver.com
Currently at Synopsys
Research Interests : Machine Learning
Email: leejw421@gmail.com
Research Interests : Machine Learning
Email: amaryllis404@naver.com
Currently at Samsung Electronics
Research Interests: NCFET, FeFET
Email: aptlap@naver.com
Ph.D. student at University of Virginia at Sep. 2021
Master Thesis: Steep slope silicon-on-insulator feedback field effect transistor :design and performance analysis
Ph.D. student at University of Michigan, Ann Arbor at Sep. 2021
Ph.D. student at University of Texas, Austin at Sep. 2021
Master Thesis: Theoretical studies for improving electrical characteristics of the nanoelectromechanical relay with negative capacitance of a ferroelectric capacitor
Ph.D. student at University of Virginia at Sep. 2021
Master Thesis: Effects of interface trap on transient negative capacitance :phase field simulation
Ph.D. student at University of Wisconsin–Madison at Sep. 2021
Currently at SK hynix (Device Engineer)
Currently at Tokyo Electron
Currently at Samsung Electronics
Currently at Samsung Electronics
Currently at Samsung Electronics (Device Engineer)
Ph.D. student at Georgia Institute of Technology at Sep. 2019
Master Thesis: Nanoelectromechanical System for Digital Logic Circuits
Ph.D. student at University of Notre Dame at Sep. 2020
Master Thesis: Study of steep switching transistor with negative differential resistance
Ph.D. student at University of Michigan, Ann Arbor at Sep. 2019
Master Thesis: Steep Switching Semiconductor Devices Above and Beyond Boltzmann Tyranny
Email: popopopf@naver.com
Currently at Samsung Electronics (Device Engineer)
Ph.D. student at University of California, Davis
Master Thesis: study of transient response of ferroelectric capacitor
Email: qwepoi2012@naver.com
Ph.D. student at University of Connecticut
Master Thesis: study of process-induced random variation in sub-10-nm stacked nanowire FET
Email: whobas@gmail.com
Ph.D. student at University of Waterloo
Master Thesis: steep switching sub-60 ㎷/decade CMOS devices using topological insulator
Email: chw0089@gmail.com
Ph.D. student at University of Michigan, Ann Arbor
Visiting student at University of California, Berkeley: Group of Prof. Sayeef Salahuddin (2015. 9 ~ 2015. 11)
Master Thesis: negative capacitance field effect transistor for ultra-low voltage and super energy saving
Email: jaesungjo11@naver.com
Ph.D. student at University of California, San Diego
Master Thesis: study of process-induced random variation on 3-D CMOS devices
Email: oyhoon1835@naver.com
Ph.D. student at Purdue University
Master Thesis: advanced electron devices beyond Boltzmann limit
Email: tinlkr@naver.com
Ph.D. student at University of Waterloo
Congratulations for winning NANOTECH SCHOLARSHIP 10,000$! (Univ. of Waterloo)
Master Thesis: study of process-induced random variation in novel tunnel field effect transistor (TFET)
Email: iicin@naver.com
Currently at SK Hynix (Device Engineer)
Master Thesis: study of steep switching devices and WFV(work-function variation)-induced random variation for ultra-low power CMOS technology
Email: youngtaek.lee@sk.com
Currently at DB HiTek
Master Thesis: process-induced random variation by line edge roughness in symmetrical tunnel FET
MS/PhD at Korea University
Currently at Samsung Electronics
Ph.D. student at Seoul National University
Email: hwkogo@snu.ac.kr
한국지역난방공사
MS at University of Seoul
Samsung Display
Currently at Samsung Research
Ph.D. student at Dongguk University (RFIC circuit design)
Master Thesis: Study of work-function variation in high-k/metal-gate (HK/MG) technology
Email: kahn0217@dongguk.edu
Currently at NIST
Ph.D. student at University of California, Riverside
Master Thesis: Line-Edge-Roughness (LER) in CMOS Devices and Vacuum-Channel Transistor
Email:
Currently at ASML
Ph.D. student at University of Science and Technology (UST), Korea Institute of Science and Technology (KIST)
Master Thesis: work-function variation in CMOS device and Monte Carlo simulation analysis for SRAM yield
Email: H16502@kist.re.kr