The III-V molecular beam epitaxy reactor was installed at KIST in 2008. This machine currently has group-III cells of Al, Ga, In, and a group-V cells of arsenic (As), antimony (Sb), phosphorus (P) with dopant cells of Be for p-type and Si, Te for n-type.
NIKON LV150NA
Optical microscope with differential interference contrast (DIC) filter. Magnification up to x1000.
Custom-built solar simulator for solar cell measurement.
Park systems XE-15
Scanning in tapping mode, contact mode
Laser diode (LD), Light-emitting diode (LED) LIV, spectrum measurement with temperature-controlled stage.
Visible wavelength (400nm-1000nm), NIR (1000nm-1650 nm), SWIR (1500nm-2450nm)
PL system with He cooled cryogenic stage
KIST Advanced Analysis Center
KIST Advanced Analysis Center
ATG Rigaku high-resolution XRD machine (45 keV, 250 mA).
operated by KIST Advanced Analysis Center
KIST Advanced Analysis Center
The cleanroom at KIST L1 is equipped with various standard photolithography machines such as spin coater, mask aligner, e-beam deposition, fume hood, and CVD.