Atomic Craft & Engineering Laboratory @ Hanyang University
Invited Talk at ACS, Spring Meeting (2018.03.18)
(Invited Speaker) “Topographically Selective Atomic Layer Deposition on 3D Nanostructures for Novel Nanopatterning Processes,” Woo-Hee Kim, and Stacey F. Bent, 255th ACS National Meeting & Exposition, New Orleans, USA, 2018.03.18.