Educational Activities

Atomic Craft & Engineering Laboratory @ Hanyang University

Teaching Activities

  • Semiconductor Materials, Spring, for Junior
  • Semiconductor Devices, Fall, for Junior
  • Semiconductor Processing, Spring, for Senior
  • Nanofabrication, Fall, for Senior
  • Thin Film Processing & Lab., Fall, for Senior
  • Advanced Semiconductor Materials & Physics 1, Spring, for Graduate
  • Advanced Semiconductor Materials & Physics 2, Fall, for Graduate
  • Advanced Thin Film Processing, Spring, for Graduate
  • Advanced Thin Film Analysis, Spring, for Graduate

Invited Lectures

  • “Surface-Determined Bottom-Up Patterning Technology toward Advanced Nanofabrication,” Wonik IPS, Pyeongtaek, Korea, 2018.11.28.
  • “Nano-materials & Nano-discovery Education: Introduction and Application of Atomic Layer Deposition,” National NanoFab Center (NNFC), Daejeon, Korea, 2018.09.20.
  • “Overview of Area-Selective Atomic Layer Deposition for Advanced Nanofabrication,” Korea Institute of Science and Technology (KIST), Jeonbuk, Korea, 2018.09.05.
  • “Process Overview for Achieving Area-Selective Atomic Layer Deposition toward Emerging Nanodevice Applications,” Hanyang University, Ansan, Korea, 2018.08.29.
  • “Process Overview for Achieving Area-Selective Atomic Layer Deposition toward Emerging Nanodevice Applications,” Hanyang University, Seoul, Korea, 2018.08.28.
  • “Topographically-Selective Atomic Layer Deposition: Surface-Determined Patterning Technology,” National NanoFab Center (NNFC), Daejeon, Korea, 2018.06.22.
  • “CAU colloquium: Topographically-Selective Atomic Layer Deposition on 3D Nanostructure for Emerging Nanodevice Applications,” Chung-Ang University, Seoul, Korea, 2018.03.29.
  • “KHU colloquium: Surface Engineering for Advanced Nanoelectronics,” Kyung Hee University, Yongin, Korea, 2018.03.28.
  • “Surface Chemistry & Formation of ALD Process,” Yonsei University, Seoul, Korea, 2018.03.05.
  • “Atomic Scale Thin Film Process & Engineering in Nanofabrication,” Hongik University, Seoul, Korea, 2018.02.19.
  • “Topographically-Selective Atomic Layer Deposition for Emerging Nanodevice Applications,” Incheon National University, Incheon, Korea, 2018.02.12.
  • “Surface Engineering for Advanced Nanoelectronics,” Sejong University, Seoul, Korea, 2017.12.19.
  • “Surfaces and Thin Film Physics,” Kyung Hee University, Yongin, Korea, 2017.12.20.
  • “Surface Engineering for Advanced Nanoelectronics,” Yeungnam University, Daegu, Korea, 2017.12.19.
  • “Thin Film Process & Characterizations of Metal Work Functions in Nanoelectrocnics,” Pusan National University, Busan, Korea, 2017.11.17.
  • “Atomic Scale Thin Film Process & Engineering in Nanofabrication,” Kwangwoon University, Seoul, Korea, 2017.11.09.
  • “Surface Engineering for Advanced Nanoelectronics,” Korea Institute of Industrial Technology (KITECH), Gangneung, Korea, 2017.11.02.
  • “Surface Engineering for Advanced Nanoelectronics,” Yonsei University, Seoul, Korea, 2017.08.28.
  • “Thin Film Process & Engineering in Nanofabrication,” Incheon National University, Incheon, Korea, 2017.07.23.
  • “Surface Engineering for Advanced Nanoelectronics,” University of Ulsan, Ulsan, Korea, 2017.07.12.
  • “Topographically-Selective Atomic Layer Deposition and Atomic Layer Etching for Novel Nanopatterning Processes,” Yonsei University, Seoul, Korea, 2016.01.21.
  • “Atomic Layer Deposition of Dielectric & Metal Thin Films for Nanoelectronics,” Yonsei University, Seoul, Korea, 2014.12.23.