Alumni

Qualification: Ph.D. in Department of Materials science and Chemical Engineering, Hanyang University

Affiliation: Samsung Electronics

Period: March 2018 ~ February 2020 (M.S. Student)
March 2020 ~ February 2024 (Ph.D. Student)

Ph.D. Thesis: Area-Selective Atomic Layer Deposition of Oxide Thin Films for Atomic Level Patterning of Next-Generation Nanodevices

Qualification: M.S. in Department of Materials science and Chemical Engineering, Hanyang University

Affiliation: Samsung Electronics

Period: October 2021 ~ February 2022 (Undergraduate Student)
March 2022 ~ February 2024 (M.S. Student)

M.S. Thesis: Area-Selective Atomic Layer Deposition on Various Substrates Using Vapor-Phase Inhibitors

Qualification: M.S. in Department of Materials science and Chemical Engineering, Hanyang University

Affiliation: -

Period: February 2022 (Undergraduate Student)
March 2022 ~ February 2024 (M.S. Student)

M.S. Thesis: Growth Retardation of Atomic Layer Deposited Metal Oxide Thin Films Using Surface Protector

Qualification: M.S. in Department of Materials science and Chemical Engineering, Hanyang University

Affiliation: Ph.D. student, Hanyang University

Period: March 2018 ~ February 2020 (M.S. Student)

M.S. Thesis: Metal Nano Patterning and Transparent Electrode Fabrication Using Electrospinning and Ion Milling

Google Sites

Report abuse