Protek A333 Network Analyzer
300 kHz - 3.2 GHz, 2 port
Location: E5 522
20 MHz
Location: E5 619
Tektronix TDS3054B Oscilloscope
500 MHz
Location: E5 619
Location: E5 619
61/2 digit resolution
Location: E5 619
Olympus MX60 Upright Microscope
Modes: Bright field & Dark field
Lenses: 5X, 20X, 50X, 100X
Location: E5 619
Raman Imaging System
Excitation Laser Module (532 nm)
Raman System Body
CCD Camera
Location: E5 619
Range 190 nm-1100 nm
Czerny-Turner, Dual Beam Monochromator
Location: E5 619
GSS 3-Zone Tube Furnace
Max. Temperature: 1150 °C
Tube size: 2.5 inch
3-Zone temperature control
4 MFC: Ar, O2, N2, CH4
Feedthrough
Location: E5 619
Superuser: Chaehyun Ryu
SH Scientific High Temp. Furnace
Max. Temperature: 1200 °C
Vaccum Dry Oven
Capacity: 8L
Temperature range: 5 ℃ -250 ℃
Internal size : 200*200*200mm
Thermal Probe station
Max. Temperature: 900°C
Chamber Volume: 1 liter
PID Control
K-type TC sensor
Location: E5 619
Max Temperature: 1600 °C
PID control
B type TC sensor
Location: E5 619
Linear Motor Stage
Repeated Force Testing
Travel Distance: 200 mm
Control System
Universal Materials Tester
Min Force: 0.1N
Stress-Strain Curve
Multiple Chucks
Stage: 6-inch with vacuum
2 RF Manipulators
4 DC Manipulators
Location: E5 522
Superuser: Soon In Jung
Pitch: 150 um
GSG configuration with SMA(F)
Location: E5 522
K&S 4522 Wire Ball Bonder
Operation: semi-auto
Wire: Au
Location: E5 619
Superuser: Chaehyun Ryu
M5VC Vacuum Chamber Probe Station
Microscope & CCD Camera
Vacuum Positioner
2 RF Manipulators
4 DC Manipulators
Location: E5 619
Hantech Hydraulic lab Press
Pressing device for molding powder (using metal mold)
Pressurization method: Hydraulic Cylinder Compression
Produce various presses by pressure, function, and shape
Max RPM: 4000
Max Capacity: 6x15 ml
For polymer mixing
Maximum capacity 140 g
Ion Sputter Coater
Gold Target Material
Sputter time: 20 sec, 40 sec, 60 sec