Microwave Plasma Source and Process
- Diamond heteroepitaxy source and process
- Large area MPCVD source
- Surface Wave Plasma sources
- Novel microwave plasma source based on metamaterial structure
- Slot antenna design
- Low damage PEALD/PEALE sources based on MWP
- Long Linear microwave plasma sources
Etch Process
- Development of HAR etch process based on hybrid type plasma source (PEALD & RIE)
- Sidewall passivation mechanism and control for high aspect ratio etch
( Poly Si, SixNy , SiO2, etc)
Pulsed Plasma sources
- Pulsed CCP(Capacitively Coupled Plasma), Pulsed ICP(Inductively Coupled Plasma) sources
High Yield, Low damage, Low temperature plasma sputtering process
- DC, RF magnetron sputtering process for low temperature sputtering
(Cu, Ti, TiN, Tiw, etc)
- Development of Sputtering Process Technology for Advanced Packaging
Plasma diagnostics
- Langmuir probe system
- OES diagnostics
- V-I probe diagnostics
- IEDF analysis
Plasma simulation
- Plasma fluid simulation (include heat transfer, fluid flow model, etc)
- Etch feature profile simulation
- Plasma surface interaction
- Plasma bulk chemistry
Plasma process optimization based on AI tech
- Application of data-driven plasma simulation technology to process optimization
- AI-Driven Data Mining for Plasma Process Optimization