We are a research team that studies on low temperature plasma, plasma source technology and semiconductor manufacturing process. Our recent research focuses on the development of next generation plasma sources and plasma-material interactions in industrial applications. To achieve this, we combine plasma experiments with numerical simulation.
Our current research focuses on:
• Low temperature, low damage sputtering process
• Next-generation plasma sources(MWP, CCP, ICP, pulsed RF/DC, and hybrid source)
• Etching, deposition, epitaxy, and advanced materials processing(including atomic-scale process and next-generation materials) for semiconductor manufacturing
• Plasma chemical reactions under various process conditions
• Data-driven plasma simulation and its application to process optimization
If you are interested in our research, please feel free to contact us.