Pulsed DC plasma sputtering
RF sputtering
Magnetron Sputter
application : Al, Ti, TiN, ITO , etc
CCP type plasma source
narrow gap discharge
shower head type source
application : Al2O3, HfO2, C(amorphous carbon), etc
CCP type plasma source
Dielectric Etch
application : Si, SiO2, etc
Plasma fluid simulation
EM simulation, Heat transfer simulation, etc
3D Etch feature profile simulation for plasma processing
Optical Emission Spectroscopy, SR4
RF Power meter, directional power sensor and impedance anlayser