We are a research team that studies on low temperature plasma, plasma source technology and semiconductor manufacturing process. Our recent research focuses on the development of next generation plasma sources and plasma-material interactions in industrial applications. To achieve this, we combine plasma experiments with numerical simulation.
Our current research topics include 1) Low temperature, low damage sputtering process, 2) low temperature plasma sources(MWP, CCP, ICP, pulsed RF/DC plasma), 3) etching, deposition and material process(including atomic scale process) for semiconductor manufacturing, 4) plasma chemical reactions under various process conditions.
If you are interested in our research, please feel free to contact us.