RESEARCH

J. Kim Lab Research Overview

Development of in-situ electrical/materials characterization tool

in-situ characterization for an effective doping method of oxide and 2D materials for 3D structure applications
in-situ reflection absorption infra-red spectroscopy (RAIRS) for ALD cycle characterization

Su Min Hwang et al 2019 ECS Trans. 92 265, DOI 10.1149/09202.0265ecst

Advanced Materials

Jaebeom Lee, ACS Appl. Mater. Interfaces 2020, 12, 32, 36688–36694, https://doi.org/10.1021/acsami.0c07548

Su Min Hwang et al ACS Appl. Nano Mater. 2021, 4, 3, 2558–2564, https://doi.org/10.1021/acsanm.0c03203

Advanced Devices and Applications

Sub 5 nm CMOS technology
Hf based fluorite ferroelectric thin films for low voltage operation applications
Carbon doped transition metal oxide for ReRAM
Induim nitride (InN) deposited by PE-ALD for alternative novel channel
Memory Driven Logics and Neuromophic computing
Power/RF Devices
Sensor/Energy Devices
Flexible Devices

Minjong Lee et al 2024 IEEE Symposium on VLSI Technology and Circuits, Honolulu, HI, USA, 2024, pp. 1-2, DOI: 10.1109/VLSITechnologyandCir46783.2024.10631444

Atomic Precise Process

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