Synthesis and Characterization Capabilities

Synthesis Capabilities: Our group has an extensive track record in the synthesis of thin films of both inorganic and organic-based materials. We provide a brief summary here partitioned by growth technique.

Chemical Vapor Deposition (CVD)

• Vanadium tetracyanoethylene (V[TCNE]2)

• Vanadium Methyl Tricyanoethylenecarboxylate (V[MeTCEC]2)

• Vanadium Ethyl Tricyanoethylenecarboxylate (V[ETCEC]2)

• Vanadium Pyrrolo[2,3-d:5,4-d']bis(thiazole)

RF Sputtering and Electron-Beam Evaporation

• Metallic ferromagnets (Fe, Co, Ni and alloys)

• Metallic thin films (Au, Ag, Pt, Ti, W, ...)

• Insulating thin films (SOx, SiNx, MgO)

• Superconducting thin films (Nb, NbN)

Fabrication Capabilities: Our group has extensive expertise in micro- and nano-scale pattering of organic, inorganic (bulk and 2D), and air sensitive thin films including device fabrication of DC (FETs, Hall bars, ...), RF (waveguides, resonators, ...), and optoelectronic (LEDs, photodetectors, ...) structures. A brief summary of our available techniques includes:

• Electron beam lithography

• Focused ion beam (FIB) milling and material deposition

• Photolithography (mask based and maskless)

• Wet chemical etching

• Reactive ion etching (RIE, dry etching)

• Exfoliation and stacking of 2D materials to produce Van DerWaals heterostructures

• Air-free processing (in an Ar glove box)

  • Shadow masking using both conventional masks (down to 100 micron) and FIB-milled (down to 1 micron) SiN membranes (CVD and metal evaporation)

  • Encapsulation